| AVS 65th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-ThP2 Investigation of Target State by Plasma Emission and Target Voltage Measurements for Reactive Sputtering of Ni oxide thin films with water vapor injection Yuki Yokoiwa, Y. Abe, M. Kawamura, K.H. Kim, T. Kiba, Kitami Institute of Technology, Japan |
| TF-ThP3 Rectification and Non-linearity in Ferroelectric Tunnel Junction based on BiFeO3 Ultra-thin Film Taekjib Choi, Sejong University, Republic of Korea |
| TF-ThP7 Optical and Electrochemical Properties of Rhodium Oxide Thin Films prepared by Reactive Sputtering in O2 or H2O Atmosphere ChanYang Jeong, Y. Abe, M. Kawamura, K.H. Kim, T. Kiba, Kitami Institute of Technology, Japan |
| TF-ThP8 Interfacial Self-assembled Monolayers as Copper Diffusion Barrier for IGZO Semiconductor Thin Film Transistor Sung-Eun Lee, K.-H. Lim, J. Park, J.-E. Huh, J. Lee, E.G. Lee, C.I. Im, Y.S. Kim, Seoul National University, Republic of Korea |
| TF-ThP9 Atmospheric-pressure Plasma Treatment Effect of Solution-processed Aluminum Oxide Gate Insulator for Oxide Semiconductor Thin-film Transistors Jintaek Park, K.-H. Lim, S.-E. Lee, J.-E. Huh, J. Lee, E.G. Lee, C.I. Im, Y.S. Kim, Seoul National University, Republic of Korea |
| TF-ThP10 Microstructural and Electrical Properties of Ni Stanogermanides formed on Ge0.92Sn0.08 epi-layer Grown on Si(100) Substrate C.J. Choi, Semiconductor Physics Reasearch Center(SPRC), Chonbuk National University, Republic of Korea, HanSoo Jang, Semiconductor Physics Reasearch Center(SPRC), Chonbuk National Universityh, Republic of Korea |
| TF-ThP11 Radiation Effects on Al2O3 Thin Films H.P. Zhu, X. Chen, Zhong-Shan Zheng, D.L. Li, J.T. Gao, B. Li, J.J. Luo, Institute of Microelectronics of Chinese Academy of Sciences, China |
| TF-ThP12 Comparative Study of Erosion on Various Polymers and Composites both Coated Using a DC Magnetron Sputtering Process and Uncoated S. Hill, Dorina Mihut, A. Afshar, K.J. Culp, Z. Grantham, Mercer University School of Engineering |
| TF-ThP13 Plasma-enhanced Atomic Layer Deposition of Molybdenum Compounds Thin Films Using Mo(CO)6 with Various Plasma Gases Jeong-Hun Choi, S.W. Lee, C.M. Hyun, J.-H. Ahn, Korea Maritime and Ocean University, Republic of Korea |
| TF-ThP14 Development of Metal Linear Evaporator for OLED Panel Mass Production of Gen.6 half and Gen. 8 lines Jung Hyung Kim, Korea Research Institute of Standards and Science (KRISS), Republic of Korea, M.S. Kang, K.S. Shin, D.M. Lim, Fineva Co., Republic of Korea |
| TF-ThP16 Fabrication of Mo/B4C Periodic Films on the High Reflective Mirror for Applications in Beyond Extreme Ultraviolet Lithography Chao-Te Lee, W.-C. Chen, H.-P. Chen, M.-K. Wang, Instrument Technology Research Center, Taiwan, Republic of China |
| TF-ThP17 Effects of the Electric Field Application for the Photocatalytic Property of TiO2/Ni Thin Films Taishi Segawa, I. Takano, Kogakuin University, Japan |
| TF-ThP18 Crystallization Behavior and Thermal Stability of Zr-based Metallic Glasses J.S. Park, D.H. Song, JinKyu Lee, Kongju National University, Republic of Korea |
| TF-ThP19 The Investigation of the Chemical State of the PTFE Surface Treated by Ar Plasma Koki Iesaka, I. Takano, Kogakuin University, Japan |
| TF-ThP20 The Influence of ZnO Layers for Photovoltage of Cu2O/ZnO/TiO2 Thin Films Prepared by Reactive Sputtering Keisuke Ishizaka, Kogakuin University,Japan, I. Takano, Kogakuin University, Japan |
| TF-ThP21 The Formation of Amorphous Carbon Thin Films by Ion Beam Mixing Kenji Iwasaki, I. Takano, Kogakuin University, Japan |
| TF-ThP22 Enhancing Ultra-violet Optical Properties of Aluminum Mirrors with a Single Step Approach to Oxide Removal and Fluorine Passivation David Boris, U.S. Naval Research Laboratory, A.C. Kozen, ASEE Postdoctoral Fellow, J. del Hoyo, M.A. Quijada, NASA Goddard Space Flight Center, S.G. Walton, U.S. Naval Research Laboratory |
| TF-ThP24 Using a Semitransparent Underlayer to Determine Optical Constants of a Mostly Opaque Layer by Thin Film Interference: Application to AlF3 on Al in the Extreme Ultraviolet Gabriel Richardson, K.M. Wolfe, M.D. Barona, R.S. Turley, D.D. Allred, Brigham Young University |
| TF-ThP25 Thermoelectric Properties of Sb2Te3 Thin Films Eshirdanya McGhee, B. Bohara, C. Payton, S. Gere, S. Budak, Alabama A&M University |
| TF-ThP26 Thermal Annealing Effects on the Thermoelectric Properties of CoAg Thin Films Satilmis Budak, S. Gere, E. McGhee, E. Gamble, Alabama A&M University |
| TF-ThP28 Interlayer Effect for Photocatalytic Properties of TiO2/Cu2O Thin Films Prepared by Reactive Sputtering Akihiro Joichi, I. Takano, Kogakuin University, Japan |
| TF-ThP29 The effect of Proton Radiation on ALD HfO2 Films and HfO2 based RRAM Panpan Xue, University of Wisconsin-Madison, Z. Wang, Stanford University, T. Chang, University of Wisconsin-Madison, Y. Nishi, Stanford University, Z. Ma, J.L. Shohet, University of Wisconsin-Madison |
| TF-ThP30 Comparison of Hafnium Oxide and Zirconium Oxide for Fabricating Electronic Devices Kenneth Davis, Z. Duncan, M. Howard, T. Wimbley, Z. Xiao, Alabama A&M University |
| TF-ThP31 Development of the Synchrotron-based Capabilities for Direct, In-situ XANES/XAFS Measurements of Thermal ALD: Initial Proof-of-Concept Study Exploring ZrO2 ALD David Mandia, B. Kucukgok, S. Letourneau, M.J. Ward, A. Yanguas-Gil, J.W. Elam, Argonne National Laboratory |
| TF-ThP32 Nitridation of Transition Metal Oxide Films Li Chang, W.-L. Chen, K.A. Chiu, Y.S. Fang, National Chiao Tung University, Hsinchu, Taiwan, Taiwan, Republic of China |
| TF-ThP36 Investigation of Synthesis Yield Variation of Single-Walled Carbon Nanotubes inside Horizontal Chemical Vapor Deposition Systems G.-H. Jeong, Sung-Il Jo, Kangwon National University, Republic of Korea |
| TF-ThP37 Optical and Mechanical Properties of Diamond-like Carbon Thin Film deposited by Filtered Cathodic Vacuum Arc Source for Durable Coating of Infrared Optics Jung-Hwan In, M.W. Seo, H.Y. Jung, S.H. Kim, J.H. Choi, Korea Photonics Technology Institute, Republic of Korea |
| TF-ThP38 Influence of Temperature and Plasma Gas Chemistry on Atomic Layer Epitaxial Growth of InN on GaN Assessed with In Situ Grazing Incidence Small-Angle X-ray Scattering Jeffrey Woodward, S.G. Rosenberg, American Society for Engineering Education (residing at U.S. Naval Research Laboratory), N. Nepal, S.D. Johnson, U.S. Naval Research Laboratory, C. Wagenbach, Boston University, A.C. Kozen, American Society for Engineering Education (residing at U.S. Naval Research Laboratory), Z.R. Robinson, The College at Brockport - SUNY, D.R. Boris, S.G. Walton, U.S. Naval Research Laboratory, K.F. Ludwig, Boston University, C.R. Eddy, Jr., U. S. Naval Research Laboratory |
| TF-ThP39 Water-based Superconcentrated Electrolytes as Gate Dielectric for High-performance Solution-processed Oxide Thin Film Transistors Eun Goo Lee, K.-H. Lim, J.T. Park, S.-E. Lee, J.H. Lee, C.I. Im, Y.S. Kim, Seoul National University, Republic of Korea |
| TF-ThP40 Atomic Layered Deposition and Characterizations of HfO2 for OLED Encapsulation Nak-Kwan Chung, Korea Research Institute of Standards and Science (KRISS), Republic of Korea, S. Kim, J.Y. Yun, J.T. Kim, Korea Research Institute of Standards and Science (KRISS) |
| TF-ThP41 Reaction Mechanism Study on the Atomic Layer Deposition of Titanium Oxide Film using Heteroleptic Precursors Jaemin Kim, H.-L. Kim, J. Gu, S. Kim, H. Jung, R. Hidayat, Y. Myung, W.-J. Lee, Sejong University, Korea |