AVS 65th International Symposium & Exhibition
    Thin Films Division Thursday Sessions
       Session TF-ThP

Paper TF-ThP21
The Formation of Amorphous Carbon Thin Films by Ion Beam Mixing

Thursday, October 25, 2018, 6:00 pm, Room Hall B

Session: Thin Film Poster Session
Presenter: Kenji Iwasaki, Kogakuin University, Japan
Authors: K. Iwasaki, Kogakuin University, Japan
I. Takano, Kogakuin University, Japan
Correspondent: Click to Email

Recently, single-layer graphene sheets, diamond films or carbon nitride films have attracted attention as high-functional materials containing carbon. Among them, Diamond-Like Carbon (DLC) is an amorphous carbon film showing superior characteristics which are close to diamond. Since those characteristics are high hardness, low friction coefficient, etc., amorphous carbon is used in a wide range of mechanical fields such as machine parts or engine parts. On the other hand, as new characteristics of amorphous carbon, the gas barrier or the biocompatibility is studied and amorphous carbon is also applied to food containers or medical instruments.

Amorphous carbon films are fabricated by various methods such as physical vapor deposition or chemical vapor deposition. Because almost amorphous carbons have the high internal stress, the adhesion between the formed carbon film and the substrate became often a important problem. In our studies, amorphous carbon films have been formed by using the ion beam irradiation in a hydrocarbon gas atmosphere to improve the adhesion between the carbon film and the substrate. Generally it is known that the mixing layer in interface of a substrate is formed by high energy ions. In the experiment of the ion beam mixing method, the multi-process coating apparatus with a mass analyzer of 45 degrees in a beam line from the Freeman type ion source was used. C2H2 used as an atmosphere gas has a higher deposition rate than other hydrogen gases such as ethylene (C2H4) or methane (CH4).

In the experiment, an N+ or an N2+ ion beam was irradiated in a C2H2 atmosphere to various substrates (Stainless steel, Al, Cu, Si) at conditions of 20 kV in an ion energy and of 2 - 10 mA/cm2 in an ion current density. Obvious depth profiles of N element was obtained by a field emission Auger micro probe, while the slight deposition of amorphous carbon on the surface of each substrate was observed regardless of a value of an implanted N element.