| AVS 65th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-TuP2 N2/H2, O2 and NF3 Dissociation Percentages in a Remote, Low Frequency, High Density Plasma Source Yingliang Zhou, H. Li, V.M. Donnelly, University of Houston, J. Chiu, X. Chen, MKS Instruments, Inc., Pressure and Vacuum Measurement Group |
| PS-TuP3 Thermal Atomic Layer Etching of Silicon and Silicon Nitride Using an Oxidation and “Conversion-Etch” Mechanism Aziz Abdulagatov, S.M. George, University of Colorado at Boulder |
| PS-TuP4 Annihilation Kinetics of Plasma-induced Electronic Defects in Semiconductor Materials S. Nunomura, Isao Sakata, K. Matsubara, National Institute of Advanced Industrial Science and Technology (AIST), Japan |
| PS-TuP5 High efficiency Magnetic Induction Plasma Source for Remote Plasma Removal Process TaeSeung Cho, S. Park, D. Lubomirsky, Applied Materials |
| PS-TuP6 Aspect-ratio and Line-edge Fluctuation Controlled Nanolithography using Poly(styrene-b-Dimethylsiloxane) and Amorphous Carbon Layer JiSoo Oh, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| PS-TuP7 Development of A Low-Cost ZnO Nanorods-Based Gas Sensor with an Integerated Microplasma Generation Unit for Ethanol Sensing Sz-Yun Lin, F.-H. Huang, C.-C. Hsu, National Taiwan University, Taiwan, Republic of China |
| PS-TuP8 Development of a Plasma Generation Device Integrated with a Piezoelectric Spray to Detect Metal Ions in Solution Ting-Ting Pan, S.-Y. Lin, C.-C. Hsu, National Taiwan University, Taiwan, Republic of China |
| PS-TuP9 Development of a Light-weight System for Detection of Metal Ions in Solutions Using Plasma Spectroscopy Ching-Yu Su, S.-Y. Lin, C.-C. Hsu, National Taiwan University, Taiwan, Republic of China |
| PS-TuP10 Inductively Coupled Plasma Reactive Ion Etching of Nanometer-scale Patterned Copper Thin Films using Alcohol-based Gases Jinsu Ryu, E.T. Lim, D.W. Park, C.W. Chung, INHA University, Republic of Korea |
| PS-TuP11 Etch Characteristics of Nanometer-scale Patterned Cu Thin Film Using Pulse- modulated RF Source Plasma Euntaek Lim, J.S. Ryu, C.W. Chung, INHA University, Republic of Korea |
| PS-TuP12 Etch Characteristics of Magnetic Tunneling Junction Materials by Using Noble Gas and Hydrogen SooGang Kim, K.C. Yang, Y.J. Shin, D.I. Sung, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| PS-TuP13 Particle Temperature Histories in a Tubular Low Temperature Plasma Reactor: Relevance to the Synthesis of Amorphous Metal Alloys N.B. Uner, Elijah Thimsen, Washington University in St. Louis |
| PS-TuP15 Easy Synthesis of Hybrid Laterally or Vertically Patterned Hydrophobic/Hydrophilic Surfaces using a Dielectric Barrier Discharge Annaëlle Demaude, Université Libre de Bruxelles, Belgique, M.J. Gordon, University of California at Santa Barbara, F. Reniers, Université Libre de Bruxelles, Belgium |
| PS-TuP16 Plasma-based Approach to Driving an Amorphous-To-Crystalline Phase Change in MoS2 Grown on Polymers S.G. Walton, D.R. Boris, U.S. Naval Research Laboratory, A.C. Kozen, American Society for Engineering Education, Gary Kushto, U.S. Naval Research Laboratory, M.J. Johnson, National Research Council, R.H. Rai, University of Dayton, N.R. Glavin, Air Force Research Laboratory, C. Muratore, University of Dayton |
| PS-TuP17 Atmospheric Plasma Deposition of Vanadium Oxide Thin Coatings on Cold and Heated Substrates Antoine Remy, Université Libre de Bruxelles, Belgium, M.J. Gordon, University of California at Santa Barbara, F. Reniers, Université Libre de Bruxelles, Belgium |
| PS-TuP18 The Increased Efficiency Of The Amorphous/Silicon Heterojunction Solar Cells With Silicon Micro-Channels In Back Side Substrate Hugo Alvarez, G.L. Bertão, A.R. Silva, F.H. Ciodin, J.A. Diniz, University of Campinas, Brazil |
| PS-TuP19 Effect of RF Plasma on H Radical Generation on DCMS Produced a-Si:H Jan Uhlig, E. Barlaz, D.N. Ruzic, University of Illinois at Urbana-Champaign |
| PS-TuP20 Hardmasks of TiN and Al for Silicon Micro-Channel Definition via ICP Plasma Etching Process Camila Ruiz, Plasma Nanotechnology Research Center, UNICAMP, Brazil, J.A. Diniz, A.M. Rosa, Plasma Nanotechnology Research Center, University of Campinas, Brazil |
| PS-TuP21 Time- and space-resolved Diagnostics of a Self-Neutralized Ion Beam Extracted from a Pulsed Plasma Ryan Sawadichai, Y.-M. Chen, University of Houston, S. Tian, Lam Research Corporation, V.M. Donnelly, P. Ruchhoeft, D.J. Economou, University of Houston |
| PS-TuP22 Vacuum-ultraviolet-radiation Damage of Low-k Dielectrics J. Leon Shohet, S.-H. Kim, H.M. Nguyen, P. Xue, J. Blatz, H. Cheng, University of Wisconsin-Madison, Y.-H. Lin, NSRRC, Taiwan, J.-F. de Marneffe, M. Redzheb, S. Armini, IMEC, Belgium, C.-C. Chen, NSRRC, Taiwan, Y. Wu, University of Wisconsin-Madison |
| PS-TuP23 Porous Alumina as a Vacuum Ultraviolet Transmission Window Yuting Wu, H. Cheng, University of Wisconsin-Madison, Y.-H. Lin, C.-C. Chen, H-S. Fung, NSRRC, Taiwan, J.L. Shohet, University of Wisconsin-Madison |
| PS-TuP25 Development of an In-situ Plasma Enhanced Atomic Layer Etching System for III-group Nitride Device Process C.P. Lin, Y.H. Lin, C.C. Chen, M.K. Wang, National Applied Research Laboratories, Taiwan, Republic of Korea, C.N. Hsiao, National applied research Laboratories,Taiwan, Republic of Korea, F.Z. Chen, National Applied Research Laboratories, Taiwan, Republic of Korea |
| PS-TuP26 Advances in the Spectroscopic Characterization of Ceramic Films and Coatings Fuhe Li, A. Tavakoli, J. Brim, Air Liquide Electronics - Balazs NanoAnalysis |
| PS-TuP27 Effect of Plasma Configuration on Defect-free Functional Doping on Graphene Surface Goo-Hwan Jeong, S.-I. Jo, Kangwon National University, Republic of Korea |
| PS-TuP28 Fluid Model Numerical Simulation Analysis of Microwave Plasma Discharges Wan-Ting Chiu, National Tsing-Hua University, Taiwan, Taiwan, Republic of China, I.N. Yeh, K.C. Leou, National Tsing-Hua University, Taiwan, Republic of China |
| PS-TuP29 Evaluation of Simulation Tool for a Plasma Generation based on the Dual Property of Electrons Shinichiro Kitamoto, P. Abraha, Meijo University, Japan |
| PS-TuP30 Plasma Nitriding of Highly Polished Metallic Surfaces Yoshiki Handa, P. Abraha, Meijo University, Japan |