AVS 65th International Symposium & Exhibition
    Plasma Science and Technology Division Tuesday Sessions
       Session PS-TuP

Paper PS-TuP7
Development of A Low-Cost ZnO Nanorods-Based Gas Sensor with an Integerated Microplasma Generation Unit for Ethanol Sensing

Tuesday, October 23, 2018, 6:30 pm, Room Hall B

Session: Plasma Science and Technology Division Poster Session
Presenter: Sz-Yun Lin, National Taiwan University, Taiwan, Republic of China
Authors: S.-Y. Lin, National Taiwan University, Taiwan, Republic of China
F.-H. Huang, National Taiwan University, Taiwan, Republic of China
C.-C. Hsu, National Taiwan University, Taiwan, Republic of China
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ZnO-based materials have been widely used as the gas sensing elements. The major limitations for this type of materials are the need to operate in high temperature or the requirement of the annealing step for fabrication or re-condition.

In this work, we developed a ZnO nanorods–based gas sensor integrated with a microplasma generation unit (MGU) that allows for detection of ethanol vapors at room temperatire. This device consists of a specially-designed electrode set was fabricated using toner transfer method. This allows for the operation of microplasma generation mode(MGM) and gas sensing mode(GSM). After the fabrication of the 3-electrode set, ZnO nanorods was grown by hydrothermal method for 24 hours between two electrodes. ZnO-nanorods was first treated using the plasma for 10 minutes by sensing test. By proper connection of the electrodes, the device can be operated in GSM, which allows for ethanol vapor sensing test by measuring the resistance across the ZnO nanorods. The sensor is capable to detect a wide range of ethanol vapor, from 25 to 20000 ppm. In addition, the sensor shows excellent recyclibility after repetitatively testing for over 30 cycles. We will also show that the plasma treatment of the ZnO nanorods serves as the regeneration of the sensing materials after the nanorods expose to humid air and loses their functionality for ethanol sensing.

This newly-developed integrated device offers a novel route for the dvelopment of sensing devices that allows for plasma treatment of sensing materials in-situ and on-site.