| AVS 65th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
| Session PS-TuP |
| Session: | Plasma Science and Technology Division Poster Session |
| Presenter: | Yuting Wu, University of Wisconsin-Madison |
| Authors: | Y. Wu, University of Wisconsin-Madison H. Cheng, University of Wisconsin-Madison Y.-H. Lin, NSRRC, Taiwan C.-C. Chen, NSRRC, Taiwan H-S. Fung, NSRRC, Taiwan J.L. Shohet, University of Wisconsin-Madison |
| Correspondent: | Click to Email |
Porous alumina is examined as a coupling window between an electron-cyclotron-resonance plasma used as a vacuum ultraviolet vuv source and a separate processing chamber. The porous alumina sample coupon used in this work has the following properties. The sample is 2 x 2 cm. Its thickness is 38 microns. It is composed of pores that are 20 nm in diameter resulting in a porosity of 50%.
To eliminate the effects of particles, a synchrotron was utilized to obtain the transmission properties as a function of photon energy. The transmission of VUV through porous alumina was measured as a function of wavelength is measured and was found to be nearly 50%. A silicon wafer with a dielectric surface is then placed in the processing chamber and exposed to VUV, both with and without the porous alumina window. A Kelvin probe is used to measure the surface charge induced on the wafer by photoemission in both cases, which will determine whether porous alumina can efficiently couple the VUV irradiation to a sample in a processing plasma.without significant modification to its spectrum and its resulting effects on the material. The advantage of porous alumina over a glass capillary-array window is that the hole diameters are in the nanometer range and this minimizes any particle flux compared with the glass capillary array.