| AVS 57th International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-ThP1 Effects of Substrate Temperature on the Microstructure and Mechanical Properties of Multi-Element (TiVCrZrTa)N Coatings M.H. Shiao, National Applied Research Laboratories, Taiwan, Republic of China, C.C. Jaing, K.S. Tang, Minghsin University of Science and Technology, Taiwan, Republic of China, C.T. Lee, C.Y. Su, Instrument Technology Research Center, Taiwan, Republic of China, Z.C. Chang, National Chin-Yi University of Technology, Taiwan, Republic of China, C.N. Hsiao, National Applied Research Laboratories, Taiwan, Republic of China |
| TF-ThP2 Pulsed DC Magnetron Sputtered Nickel Thin Films: A Study of Stress, Density and Electronic Properties E.D. Jones Jr., D.P. Adams, M.A. Rodriguez, Sandia National Laboratories |
| TF-ThP3 Photoluminescence Characterization using Hanle Effect in AlxGa1-xAs/GaAs Quantum Wells Grown on Processed Surfaces J. Hernández-Rosas, C. Mejía-García, IPN, Mexico, A. Winter, Universität Bayreuth, Germany, M. López-López, IPN, Mexico, A. Gilinsky, Institute of Semiconductor Physics SB RAS, Russia, H. Pascher, Universität Bayreuth, Germany |
| TF-ThP4 Electrical Characterization of GLAD Thin Films A. Lalany, R.T. Tucker, University of Alberta, Canada, M.D. Fleischauer, National Institute for Nanotechnology (NRC Canada), M.J. Brett, University of Alberta, Canada |
| TF-ThP5 Atomic Layer Deposition of Titanium Nitride Using Titanium Tetrachloride and Hydrazine D. Seghete, A.I. Abdulagatov, V.R. Anderson, A.S. Cavanagh, W. Wang, S.M. George, University of Colorado at Boulder |
| TF-ThP6 Understanding Some Pitfalls and Loopholes in Routine Characterization and Metrology of Thin Films for Solar Cells M. Scott, J. Burst, T. Gessert, National Renewable Energy Laboratory |
| TF-ThP7 Deposition of Relatively Thin Highly C-axis Oriented AlN Films for High Frequency Electro-Acoustic Devices V. Felmetsger, P. Laptev, OEM Group Inc. |
| TF-ThP8 Properties of Transparent Conducting Sn-doped In2O3 Films Deposited by Pulsed Electron Deposition M. Chen, V.C. Rincon, H.V. Nampoori, R.M. Frazier, S. Kotru, The University of Alabama |
| TF-ThP9 Synthesis and Characterization of Molybdenum Oxynitride Thin Films J.Y. Park, Y.C. Kang, Pukyong National University, Republic of Korea |
| TF-ThP10 Effects of Non-Uniformity for GaN Deposition by the Structure of Gas Inlet in MOCVD W. Yang, K. Hong, J. Joo, Kunsan National University, Republic of Korea, S. Lee, T. Lee, JUSUNG Engineering, Republic of Korea |
| TF-ThP11 In Search of New Multiferroics: Thin Film Synthesis and Characterization of Titanates of the MTiO3 (M=Ni, Fe, Mn, Co) Family R. Sanghavi, T. Varga, T. Droubay, P. Nachimuthu, V. Shutthanandan, S. Thevuthasan, Pacific Northwest National Laboratory |
| TF-ThP12 Properties of ALD Al2O3 Protective Coatings P.J. Evans, Australian Nuclear Science and Technology Organisation, Y. Murai, Nagaoka University of Technology, Japan, M. Lindsay, J. Davis, G. Triani, Australian Nuclear Science and Technology Organisation |
| TF-ThP13 Temperature Uniformity Issues of Inductive Heating in MOCVD Systems to Fabricate MQW White LEDs K. Hong, W. Yang, J. Joo, Kunsan National University, Republic of Korea |
| TF-ThP14 Investigation on the Electrical and Optical Properties of ZnO:Al Thin Films by RF Magnetron Sputtering and Annealing C.T. Lee, B.H. Liou, D.R. Liou, C.N. Hsiao, Instrument Technology Research Center, Taiwan, Republic of China |
| TF-ThP15 Photo-functional Properties for Fe-Added Titanium Dioxide Thin Films Prepared by Reactive Magnetron Sputtering S. Arahara, I. Takano, M. Sato, Kogakuin University, Japan |
| TF-ThP16 Control of Reflectivity at Substrate/Resist Interface of Nanometer-scaled Devices by Inorganic Bottom Anti-Reflection Coating (BARC) S.-Y. Kim, Korea Polytechnic College IV, Republic of Korea, N.-H. Kim, Chonnam National University, Republic of Korea |
| TF-ThP17 Ar/O2 Plasma Treatment Effects on Structural, Optical and Electrical Properties of Sputtering-deposited CdS Thin Films S.-H. Ryu, K.D. Myung, J.-S. Park, Chosun University, Republic of Korea, N.-H. Kim, Chonnam National University, Republic of Korea, W.-S. Lee, Chosun University, Republic of Korea |
| TF-ThP18 Photodissolution and Photodiffusion Effects of Silver on Electrical Characteristics of CdTe Thin Film for CdTe/CdS Solar Cells J.-S. Park, C.-H. Lim, S.-H. Ryu, Chosun University, Republic of Korea, N.-H. Kim, Chonnam National University, Republic of Korea, W.-S. Lee, Chosun University, Republic of Korea |
| TF-ThP19 Surface and Interface Characterization of ALD and PVD Thin Films for Microelectronic Applications L. Zhang, K.G. Lloyd, G. Blackman, DuPont Corporate Center for Analytical Sciences, J. Thompson, DuPont CR&D, L. Bao, J. Ryley, DuPont Engineering, D. Reardon, DuPont CR&D, M.A. Plummer, J.R. Marsh, DuPont Corporate Center for Analytical Sciences |
| TF-ThP20 Enhancing of Optical Properties of TiO2 Thin Films by N+ Ion Beam Irradiation H.A. Shukur, I. Takano, Kogakuin University, Japan |
| TF-ThP21 Influence of the Fluorine Doping on the Properties of SnO2 Thin Films F.J. De Moure-Flores, K.E. Nieto-Zepeda, J.G. Quiñones-Galvan, A. Hernandez-Hernandez, M. Olvera, M.A. Melendez-Lira, CINVESTAV-IPN, Mexico |