AVS 57th International Symposium & Exhibition
    Thin Film Thursday Sessions
       Session TF-ThP

Paper TF-ThP1
Effects of Substrate Temperature on the Microstructure and Mechanical Properties of Multi-Element (TiVCrZrTa)N Coatings

Thursday, October 21, 2010, 6:00 pm, Room Southwest Exhibit Hall

Session: Thin Film Poster Session II
Presenter: M.H. Shiao, National Applied Research Laboratories, Taiwan, Republic of China
Authors: M.H. Shiao, National Applied Research Laboratories, Taiwan, Republic of China
C.C. Jaing, Minghsin University of Science and Technology, Taiwan, Republic of China
K.S. Tang, Minghsin University of Science and Technology, Taiwan, Republic of China
C.T. Lee, Instrument Technology Research Center, Taiwan, Republic of China
C.Y. Su, Instrument Technology Research Center, Taiwan, Republic of China
Z.C. Chang, National Chin-Yi University of Technology, Taiwan, Republic of China
C.N. Hsiao, National Applied Research Laboratories, Taiwan, Republic of China
Correspondent: Click to Email
Multi-element nitride thin films of TiVCrZrTa high-entropy alloy were prepared by reactive RF magnetron sputtering technique with different substrate temperatures ranging from 25 ℃ to 400 ℃ . The microstructure and mechanical properties of the deposited nitride thin films were investigated by scanning electron microscope (SEM), atomic force microscope (AFM), transmission electron microscope (TEM), X-ray diffraction (XRD), nanoindenter, and phase shifting interferometry techniques. SEM and TEM results show that (TiVCrZrTa)N thin films exhibit a columnar structure. XRD and TEM diffraction results show a face-centered-cubic structure, and the intensity of (111) and (200) peaks increases with substrate temperatures in X-ray diffraction result. AFM measurements show the surface roughness of TiVCrZrTa nitride thin films increases slightly from 2.9 to 3.5 nm. Furthermore, the residual stress of (TiVCrZrTa)N thin films presents compressive stress and increases from 1.5 to 1.9 GPa with increasing substrate temperatures. The hardness and elastic modulus of TiVCrZrTa nitride thin films are approximate 26.5 and 240 GPa respectively, independent of the substrate temperatures.