| AVS 49th International Symposium | |
| Plasma Science | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-TuP1 Temperature Mapping in Fluorocarbon Plasmas using PLIF of CF K.L. Steffens, National Institute of Standards and Technology |
| PS-TuP2 A Comparison of the Performance Between Low Pressure Magnetized and Non-magnetized Microwave Discharges M. Perrin, T.A. Grotjohn, J. Asmussen, Michigan State University |
| PS-TuP3 Ion Attachment Mass Spectrometer(IAMS) for in situ and Fragment-free Monitoring of Plasma-CVD and Dry-etching Processes Y. Hirano, M. Nakamura, Y. Shiokawa, T. Fujii, Anelva Corporation, Japan |
| PS-TuP4 Sub-Millimeter Absorption Spectroscopy of Fluorocarbon Plasmas E.C. Benck, National Institute of Standards and Technology |
| PS-TuP5 Neutral Gas and Positive Ion Species of Ar/SF6 Inductive Plasma Discharges R.R. White, M. Tuszewski, Los Alamos National Laboratory, A.M. Marakhtanov, University of California, Berkeley |
| PS-TuP6 Introduction of a Powerful New Method of Generating Accurate Endpoint Traces Combined with Process Fault Classification for Low Dimensional Open Areas D. Knobloch, F.H. Bell, Infineon Technologies AG, Germany, K. Voigtlaender, J. Zimpel, ADP GmbH, Germany |
| PS-TuP7 Laser Thomson Scattering Diagnostics of Plasmas near Material Surfaces K. Muraoka, K. Uchino, Y. Yamagata, Hassaballa Safwat, Kyushu University, Japan |
| PS-TuP8 Study of Process Variables and Plasma Parameters during Reactive Sputtering from a Titanium Hollow Cathode Source A. Pradhan, S.I. Shah, University of Delaware |
| PS-TuP9 On the Limits of Operation of a Species-selective Gauge Based on the Penning Discharge Configuration@footnote 1@ C.C. Klepper, R.C. Hazelton, F. Barakat, J. Niemel, M.D. Keitz, HY-Tech Research Corporation, J.P. Verboncoeur, University of California, Berkeley |
| PS-TuP10 A Comparison of Techniques for Measuring Plasma-induced Damage P. Sakthivel, A. Srivastava, M. Colson, M. Tun, Axcelis Technologies, Inc. |
| PS-TuP11 Electron Energy Distribution Function Measurement in Dual Frequency Very Narrow Gap Capacitively Coupled Plasma B.I. Jeon, H.Y. Chang, Korea Advanced Institute of Science and Technology (KAIST) |
| PS-TuP12 Plasma Characteristics of Magnetically Confined Linearly Extended Inductively Coupled Plasma B.K. Song, Y.J. Lee, C.H. Jeong, G.Y. Yeom, Sungkyunkwan University, Korea |
| PS-TuP13 Large Area Plasmas Processing System Based on Electron-Beam Ionization D. Leonhardt, Naval Research Laboratory, S.G. Walton, D.D. Blackwell, SFA, Inc., R.F. Fernsler, R.A. Meger, Naval Research Laboratory |
| PS-TuP14 Large Area Surface Modification by Atmospheric Pressure Plasma for Cleaning and Adhesion Y.H. Lee, C.H. Yi, SungKyunKwan University, Korea, E.S. Choi, LG-PRC, H.C. Woo, Korea Vacuum Tech., G.Y. Yeom, SungKyunKwan University, Korea |
| PS-TuP15 Microwave Power Coupling Principles for Generating Small Microwave Plasmas S. Zuo, J.J. Narendra, A. Wijaya, D. Story, T.A. Grotjohn, J. Asmussen, Michigan State University |
| PS-TuP16 Simulation of a Micro-Plasma Reactor D. Economou, S.K. Nam, University of Houston |
| PS-TuP17 Affecting Plasma Polymerised Film Properties by the Control of Ion Energy D. Barton, R.D. Short, University of Sheffield, UK, J.W. Bradley, UMIST, UK |
| PS-TuP18 Study of Continuous Fluorocarbon Ion Deposition on Polystyrene Surfaces using Molecular Dynamic Simulations I. Jang, S.B. Sinnott, University of Florida |
| PS-TuP19 Ion Energy Distributions at the Substrate and Feature Charging During Plasma Etching A.E. Wendt, R. Silapunt, M. Patterson, R. Ding, Y.-H. Ting, University of Wisconsin - Madison |
| PS-TuP20 Energetic CF@sub 3@@super +@ and F@super +@ Bombardments of Si Surfaces using Molecular Dynamics Simulations J.J. Seo, J.W. Kang, H.J. Hwang, Chung-Ang University, Korea |
| PS-TuP21 Simulations of Topography Defects Development (Undercut and Bowing) for Deep Silicon Etching under a SF@sub 6@/O@sub 2@ Plasma Chemistry G. Marcos, University of Orleans, France, A. Rhallabi, University of Nantes, France, P. Ranson, University of Orleans, France |
| PS-TuP22 Ion Trajectories in Electron-shading Damage T.G. Madziwa, F.F. Chen, D. Arnush, University of California, Los Angeles |
| PS-TuP23 LIF Measurement of Catalytic Species in Plasma Plume for Carbon Nanotubes Formation by PLA T. Ikegami, M. Uchiyama, K. Ebihara, Kumamoto University, Japan, J. Asmussen, Michigan State University |
| PS-TuP24 Surface Investigation of Bone Tissue Treated with Non-thermal Plasmas J.-C. Cigal, C.Y.M. Maurice, E. Wagenaars, L.J. van Ijzendoorn, A.H.F.M. Baede, R. Huiskes, G.M.W. Kroesen, Eindhoven University of Technology, The Netherlands |
| PS-TuP25 Surface Modification of Polymers in the Development of Anti-Microbial Coatings for Medical Devices G.Sh. Malkov, E.R. Fisher, Colorado State University |
| PS-TuP26 Optimization of Four-component Gas He-Ne-Xe-Kr for High Efficiency Plasma Display Panel T.W. Kim, S.U. Kwon, H.J. Hwang, Chung-Ang University, Korea |
| PS-TuP27 Bond Strength Improvement of Plasma Sprayed Hydroxyapateite/Titanium Composite Coatings on Titanium: Partial Nitriding of Titanium Deposits by RF Thermal Plasma M. Inagaki, Y. Yokogawa, T. Kameyama, National Institute of Advanced Industrial Science and Technology (AIST), Japan |
| PS-TuP28 Reactive Sputtering in Hollow Cathodes S.I. Shah, A. Pradhan, University of Delaware, S. Berg, T. Nyberg, Uppsala University, Sweden |
| PS-TuP29 Process-Induced Damage by the Low Angle Forward Reflected Neutral Beam Etching D.H. Lee, M.J. Chung, H.K. Hwang, G.Y. Yeom, Sungkyunkwan University, Korea |
| PS-TuP30 Experimental Study on New Sterilization Process by using Plasma Source Ion Implantation Method with N@sub 2@ Gas M. Yoshida, Mitsubishi Heavy Industries, Ltd., Japan, T. Tanaka, S. Watanabe, T. Takagi, Hiroshima Institute of Technology, Japan, M. Shinohara, Kurita Seisakusho Manufacturing Co., Ltd., Japan, S. Fujii, Adtec Plasma Technology Co., Ltd., Japan |
| PS-TuP31 Study on the Characteristics of Neutral Species in the Low Angle Forward Reflected Neutral Beam Etching System M.J. Chung, D.H. Lee, N.G. Cho, G.Y. Yeom, Sungkyunkwan University, Korea |
| PS-TuP32 Improvement of Luminance and Luminous Efficiency through the Optimum Gas in AC Plasma Display Panel S.J. Lee, H.-J. Hwang, Chung-Ang University, Korea |
| PS-TuP33 Surface Cleaning of Organic Materials on Metal by Atmospheric Pressure Plasma C.H. Yi, Y.H. Lee, SungKyunKwan University, Korea, E.S. Choi, LG-PRC, H.C. Woo, Korea Vacuum Tech., G.Y. Yeom, SungKyunKwan University, Korea |
| PS-TuP34 A New Design in Atmospheric Plasma Generation Improves Versatility for Surface Treatment Applications in Industry D. Chrysostomou, S. Goloviatinskii, TePla AG, Germany |