AVS 49th International Symposium
    Plasma Science Tuesday Sessions
       Session PS-TuP

Paper PS-TuP17
Affecting Plasma Polymerised Film Properties by the Control of Ion Energy

Tuesday, November 5, 2002, 5:30 pm, Room Exhibit Hall B2

Session: Plasma Applications
Presenter: D. Barton, University of Sheffield, UK
Authors: D. Barton, University of Sheffield, UK
R.D. Short, University of Sheffield, UK
J.W. Bradley, UMIST, UK
Correspondent: Click to Email
By applying an RF potential onto a substrate, which is matched in phase and amplitude to these potentials in the plasma, we are able to selectively control the ion energy distribution function at a depositing surface. This technique does not perturb the bulk plasma, and therefore leaves other particles incident on the substrate, e.g. radicals, excited species, unaffected. Because of this, we are able to estimate, in-situ, the effect of ion energy upon film structure and properties. We have incorporated a suite of diagnostics including deposition rate monitor, an energy resolving mass spectrometer and an ion flux probe. Deposited films were examined ex-situ using XPS and SIMS techniques. We present data for the different monomer types triglyme and acrylic acid, and demonstrate that ion energies affect both the deposition rate, and introduces new functionalities onto the film surface.