AVS 49th International Symposium
    Plasma Science Tuesday Sessions
       Session PS-TuP

Paper PS-TuP14
Large Area Surface Modification by Atmospheric Pressure Plasma for Cleaning and Adhesion

Tuesday, November 5, 2002, 5:30 pm, Room Exhibit Hall B2

Session: Plasma Applications
Presenter: Y.H. Lee, SungKyunKwan University, Korea
Authors: Y.H. Lee, SungKyunKwan University, Korea
C.H. Yi, SungKyunKwan University, Korea
E.S. Choi, LG-PRC
H.C. Woo, Korea Vacuum Tech.
G.Y. Yeom, SungKyunKwan University, Korea
Correspondent: Click to Email
Plasma treatment for surface modification has been used to produce hydrophobic or hydrophilic surface on metals, plastics, glass, or polymers in industry. Especially, due to the possible low capital cost of ownership, simplicity, high throughput, etc. plasma surface treatment under atmospheric pressure is actively studied, currently. In this study, a novel large area atmospheric pressure plasma apparatus has been used to generate a large area atmospheric pressure plasma (plasmas larger than 700mm in width) and the effects of this type of plasma apparatus on the removal of organic material of large area glass substrates, ITO/glass, and Ag/ITO/glass for the large area display panel such as TFT-LCD panels and plasma display panels have been carried out. A low frequency AC power supply with a sine wave voltage (3-100kHz) was used to generate the plasmas under atmospheric pressure. He was used as the ignition and discharge gas and O@sub2@ was used as the reactive gas. He/O@sub2@ plasmas were generated between the two electrodes covered with a dielectric having slot shape holes and facing each other at a distance of a few mm. The sample was mounted just below the plasma region formed by these two electrodes. The size of the electrodes was 20mm(L) x 760mm(W). Using this type of atmospheric pressure plasma apparatus, dense, uniform, and very stable plasma could be obtained on the entire area of the electrode. Using this apparatus, organic materials such as photoresist were etched to estimate the cleaning rate of organic materials and cleaning uniformity. Characteristics of the plasmas were investigated by I-V characteristics using a current probe and a high voltage probe and by optical emission spectroscopy and cleaning rate was measured using a step profilometer. Characteristics of the cleaned sample surface were investigated by X-ray photoelectron spectroscopy and also by measuring contact angle of water drops.