AVS 49th International Symposium
    Plasma Science Tuesday Sessions
       Session PS-TuP

Paper PS-TuP11
Electron Energy Distribution Function Measurement in Dual Frequency Very Narrow Gap Capacitively Coupled Plasma

Tuesday, November 5, 2002, 5:30 pm, Room Exhibit Hall B2

Session: Plasma Applications
Presenter: B.I. Jeon, Korea Advanced Institute of Science and Technology (KAIST)
Authors: B.I. Jeon, Korea Advanced Institute of Science and Technology (KAIST)
H.Y. Chang, Korea Advanced Institute of Science and Technology (KAIST)
Correspondent: Click to Email
We measured Electron Energy Distribution Function(EEDF) in very narrow gap dual frequency Capacitively Coupled Plasma(CCP). 2Mhz and 27Mhz dual radio frequency is used. Electrode gap is variable bewteen 13mm and 24mm. To get the reasonable EEDF noise suppression is indispensible. We made self resonant coil with resonant frequency 2, 4, 27 and 54 Mhz to reduce rf noise. We use pulse measuring technique(double differentiation method) to get EEDF. Proper design of probe, rf noise seppression coil and low-pass filter in double differentiation circuit, we can measure EEDF in noisy plasma.