AVS 49th International Symposium
    Plasma Science Tuesday Sessions
       Session PS-TuP

Paper PS-TuP18
Study of Continuous Fluorocarbon Ion Deposition on Polystyrene Surfaces using Molecular Dynamic Simulations

Tuesday, November 5, 2002, 5:30 pm, Room Exhibit Hall B2

Session: Plasma Applications
Presenter: I. Jang, University of Florida
Authors: I. Jang, University of Florida
S.B. Sinnott, University of Florida
Correspondent: Click to Email
In this study, continuous deposition of polyatomic fluorocarbon ions (C@sub 3@F@sub 5@@super +@) on polystyrene surfaces is investigated using molecular dynamics simulations. The forces are determined using the reactive empirical bond order method for short-range interaction and Lennard-Jones potential for long-range van der Waals interaction. The incident energy of the ions is 50 eV and the incident angle is normal to surface. The results predict that 47.2 % of carbon atoms and 47.7 % fluorine atoms from incident ions are deposited on the surface. Major species remaining on the surface are the intact ion (C@sub 3@F@sub 5@@super +@) and CF@sub 2@ fragments. The average penetration depth of the ions and fragments is 1.7 nm. Some surface etching occurs during the deposition process. On average, one carbon and hydrogen atom is removed from the surface for every second ion that is deposited. Some ions or fragments combine with each other and form larger molecules. Thus, the simulations document the atomic-scale processes that ultimately lead to the growth of fluorocarbon thin films.