| AVS 54th International Symposium | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-ThP1 An In-situ Diagnostic to Detect Charging during Plasma Etching E.R. Ritz, D.N. Ruzic, R. Ramasamy, University of Illinois at Urbana-Champaign |
| PS-ThP2 The Effect of Radio-Frequency Bias on Electron Density in an Inductively Coupled Plasma Reactor, Measured by a Wave Cutoff Probe M.A. Sobolewski, National Institute of Standards and Technology, J.H. Kim, Korea Research Institute of Standards and Science |
| PS-ThP3 Measurement of Ion Energy Distribution in Dual-Frequency Capacitively Coupled Plasma S.-H. Seo, H.-S. Lee, J.-B. Lee, H.-Y. Chang, Korea Advanced Institute of Science and Technology |
| PS-ThP4 Analysis of Plasma Electrical Characteristics during Arcing and the Development of Arcing Detector in rf Discharges K.Y.H. Kim, KAIST, Republic of Korea |
| PS-ThP5 Diagnostic of Plasma Generated in Water by Time-Resolved Optical Spectroscopy C. Miron, M.A. Bratescu, T. Ishizaki, N. Saito, O. Takai, Nagoya University, Japan |
| PS-ThP6 Diagnostics of a Microwave Plasma by Optical Computerized Tomography C. Tian, T. Nozawa, K. Ishibasi, M. Horigome, Tokyo Electron LTD., Japan |
| PS-ThP7 Diagnostics in a Continuous Electron Beam-Generated Plasmas S.G. Walton, E.H. Lock, R.F. Fernsler, Naval Research Laboratory |
| PS-ThP8 In Situ Plasmas Diagnostics Study of a Commercial High Power Hollow Cathode Magnetron Deposition Tool C.H. Castano, D.N. Ruzic, B.C. Masters, M.J. Neumann, E.R. Ritz, University of Illinois at Urbana-Champaign |
| PS-ThP9 Application of Exhaust Line OES on Plasma-less Process for Advanced Process Control S. Han, Y.-J. Kim, S.W. Choi, W.-S. Han, Samsung Electronics Co. Ltd, South Korea |
| PS-ThP10 Dry Etching of Extreme Ultraviolet Lithography (EUVL) Mask Structures in Inductively Coupled Plasmas (ICP) D.Y. Kim, H.J. Lee, H.Y. Jung, N.-E. Lee, Sungkyunkwan University, Korea, T.G. Kim, B.H. Kim, J. Ahn, C.Y. Kim, Hanyang University, Korea |
| PS-ThP11 Multi-Level Resist Employing Physical-Vapor Deposited Amorphous Carbon H.T. Kim, B.S. Kwon, N.-E. Lee, H.J. Cho, B.Y. Hong, Sungkyunkwan University, Korea |
| PS-ThP12 Plasma and Electrical Characteristics of an Internal Linear Inductively Coupled Plasma Source for Flat Panel Display Processing J.K. Park, J.H. Lim, K.N. Kim, G.Y. Yeom, Sungkyunkwan University, Korea |
| PS-ThP13 Characterization of a High-Temperature Flowing Oxygen Plasma Afterglow N.D. Vora, Vanderbilt University, D.A. Pejakovic, J. Marschall, SRI International, B.R. Rogers, Vanderbilt University |
| PS-ThP14 Performance Characteristics of Inductively Coupled rf Ion Source for Low-energy Neutral Beam M. Park, KAIST, South Korea |
| PS-ThP15 Residue-free High Dose Ion-Implanted Resist Removal using a High Power O2/N2 Plasma Jet M. Bhargava, University of Houston, A.K. Srivastava, Axcelis Technologies, W. Donner, J.C. Wolfe, University of Houston |
| PS-ThP16 Study of Tungsten Oxidation in Low-Temperature Plasma Processing S. Xu, L. Diao, Mattson Technology Inc. |
| PS-ThP17 Stabilization of Ion-beam in Hall-type Plasma Processing Device F. Furukawa, Japan Aerospace Exploration Agency |
| PS-ThP18 Computational Investigation of Volume Discharge in a Nitrogen Laser S.M. Karabanov, V.A. Korotchenko, D.V. Suvorov, Ryazan State Radio Engineering University, Russia |
| PS-ThP19 Ionization Comparisons Through Filtered High Power Pulsed Magnetron Sputtering S.R. Kirkpatrick, J. Li, S.L. Rohde, University of Nebraska-Lincoln |
| PS-ThP20 Study of Micro-Trenching and Bowing with a Dry Etching Profile Simulator in a High-Density, Low-Pressure Plasma J. Saussac, J. Margot, Université de Montréal, Canada, M. Chaker, INRS, Canada |
| PS-ThP21 Effect of a High Negative DC Bias Voltage Applied on an Electrode Immersed in an Inductively Coupled Plasma A. Ranjan, University of Houston, L. Chen, Tokyo Electron U.S. Holdings, D.J. Economou, V.M. Donnelly, University of Houston |
| PS-ThP22 Planar Laser-Induced Fluorescence Measurements in an Inductively Coupled Plasma Reactor B. Jacobs, W. Gekelman, University of California - Los Angeles, M. Barnes, Intevac Corporation, P. Pribyl, University of California - Los Angeles |
| PS-ThP23 Exotic Shapes of Gold Nanoparticles Synthesized with Plasma in an Aqueous Solution J. Hieda, M. Oda, N. Saito, O. Takai, Nagoya University, Japan |