| AVS 54th International Symposium | |
| Plasma Science and Technology | Thursday Sessions |
| Session PS-ThP |
| Session: | Plasma Science and Technology Poster Session |
| Presenter: | S.-H. Seo, Korea Advanced Institute of Science and Technology |
| Authors: | S.-H. Seo, Korea Advanced Institute of Science and Technology H.-S. Lee, Korea Advanced Institute of Science and Technology J.-B. Lee, Korea Advanced Institute of Science and Technology H.-Y. Chang, Korea Advanced Institute of Science and Technology |
| Correspondent: | Click to Email |
The ion energy distribution in a large-area and dual-frequency capacitively coupled plasma (CCP) was measured by using two methods, the noninvasive ion energy analyzer (NIEA) and the quadrupole mass spectrometer (QMS). The argon plasma was generated by 2 and 13.56 MHz RF powers, which were separately applied to two electrodes with a diameter of 600 mm and a gap distance of 50 mm between two electrodes. The NIEA detector was installed between the matching network and the electrode at two electrodes. It was found that the the energy distribution of ions incident to the low-frequency (LF) RF electrode exhibits a characteristic distribution with a series of peaks when 2 and 13.56 MHz RF power are applied simultaneously while it exhibits a single peak distribution or a well-known double peak distribution when a single RF power is applied or it is measured at high-frequency (HF) RF electrode. Those structured ion energy distributions were observed for a variety of the power ratio of two RF powers. The QMS equipment was installed inside the LF RF electrode. And, the energy distribution of ions incident to the LF RF electrode was measured by using the QMS and was compared with the ion energy distribution measured by the NIEA. The features of the ion energy distribution were analyzed and explained by the modulation of the sheath potential by two RF frequencies, which could be measured with the high-voltage probe at the electrode.