| AVS 54th International Symposium | |
| Plasma Science and Technology | Thursday Sessions |
| Session PS-ThP |
| Session: | Plasma Science and Technology Poster Session |
| Presenter: | C.H. Castano, University of Illinois at Urbana-Champaign |
| Authors: | C.H. Castano, University of Illinois at Urbana-Champaign D.N. Ruzic, University of Illinois at Urbana-Champaign B.C. Masters, University of Illinois at Urbana-Champaign M.J. Neumann, University of Illinois at Urbana-Champaign E.R. Ritz, University of Illinois at Urbana-Champaign |
| Correspondent: | Click to Email |
A variety of plasma diagnostics can be used to study the detailed influence of parameter variation on the plasmas used for PVD and PECVD on a commercial 200mm iNOVA high power hollow cathode magnetron deposition tool. Because of the special plasma conditions, non-standard geometry, and some non-standard frequencies used, specifically designed diagnostics are preferable to commercial solutions. These diagnostics include Langmuir probe analysis for electron temperature and density, a Faraday cups to study ion energy and density, optical spectroscopy for ion species identification and energy, quartz crystal microbalances combined with electrostatic and magnetostatic filters for deposition rates and ionization fraction of the incident metal atom species. Initial results from the plasma studies will be shown and compared tto theoretical calculations for ionization fraction and efficiency.