| AVS 54th International Symposium | |
| Plasma Science and Technology | Thursday Sessions |
| Session PS-ThP |
| Session: | Plasma Science and Technology Poster Session |
| Presenter: | C. Tian, Tokyo Electron LTD., Japan |
| Authors: | C. Tian, Tokyo Electron LTD., Japan T. Nozawa, Tokyo Electron LTD., Japan K. Ishibasi, Tokyo Electron LTD., Japan M. Horigome, Tokyo Electron LTD., Japan |
| Correspondent: | Click to Email |
A Radial Line Slot Antenna (RLSA) for surface-wave-plasma at 2.45GHz is a promising candidate with respect to increased process requirements for the large-diameter plasma. Diagnostics of such a kind of plasma was performed by Optical Emission Spectroscopy (OES) under various process conditions. Time-averaged computerized tomography has been developed to obtain a sliced 2D-image for optical emission from the RLSA plasma, which gives some useful information of spatial distribution of the relative net production rate of ions and radicals. The discharge chamber is about 35 cm in diameter and 20 cm in depth with a dielectric window 3 cm thick on the top. A smart optical scanner is amounted to the observe quartz window at the plasma diffusion level. The intensity of optical emission at selected wavelength throughout OES can be reconstructed to a spatial profile of species in RLSA plasma. We performed the measurement under low-k CVD process condition for the spatial distribution of species CFx. The changes of spatial distribution of ions and radicals of CFx under different RF bias and stage temperature reveal some essential plasma dynamics relate to the property of Low-k film. It has been concluded that the optical computerized tomography provides a way for fast plasma diagnosis and efficient real time process control.