AVS 53rd International Symposium | |
Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
PS3-TuP1 Room Temperature Crystallization of Amorphous Thin Films using RF Plasma Y. Shibayama, M. Suzuki, A. Kinbara, T. Watanabe, H. Ohsaki, The University of Tokyo, Japan |
PS3-TuP2 Formation of Ultra Water-Repellent Thin Films in Organosilane Plasma by PECVD Method Y.S. Yun, T. Yoshida, N. Shimazu, Y. Inoue, N. Saito, O. Takai, Nagoya University, Japan |
PS3-TuP3 Controlling the Fluxes of Carbon Supply for Carbon Nanotube Growth in CH@sub 4@/H@sub 2@ Plasma A. Okita, Y. Suda, A. Ozeki, Hokkaido University, Japan, A. Oda, Nagoya Institute of Technology, Japan, J. Nakamura, Tsukuba University, Japan, K. Bhattacharyya, H. Sugawara, Y. Sakai, Hokkaido University, Japan |
PS3-TuP4 Pulsed PECVD Processes with E-beam Generated Plasmas D. Leonhardt, S.G. Walton, US Naval Research Laboratory |
PS3-TuP5 Diagnostics of Microwave Plasmas Applied for Organic Layer Deposition S.F. Dribinskiy, G. Franz, Munich University of Applied Sciences, Germany, D. Voss, Plasma-Parylene Coating Services, Germany |
PS3-TuP6 Behavior Analysis of Various Organosilicon Molecules in PECVD Processes T. Yoshida, Y.S. Yun, N. Shimazu, Y. Inoue, N. Saito, O. Takai, Nagoya University, Japan |
PS3-TuP7 Amorphous Carbon Coating Mixed with Nano Crystalline Diamonds N. Sakudo, N. Ikenaga, Y. Tashiro, A. Sakamoto, Kanazawa Institute of Technology, Japan |
PS3-TuP8 Polymer Surface Modification using Electron Beam-Generated Plasmas S.G. Walton, D. Leonhardt, US Naval Research Laboratory |
PS3-TuP9 Chemical Modification of the Poly(Vinylidene Fluoride-Trifluoroethylene) Surface through Fluorocarbon Ion Beam Deposition W.-D. Hsu, I. Jang, S.B. Sinnott, University of Florida |
PS3-TuP11 Atmospheric Plasma Deposition of Silicon Dioxide Coatings on Metal A.M. Ladwig, University of California - Los Angeles, S.E. Babayan, Surfx Technologies, M.D. Smith, W. Highland, National Nuclear Security Administration's Kansas City Plant Operated by Honeywell Federal Manufacturing and Technologies, R.F. Hicks, University of California - Los Angeles |
PS3-TuP12 Properties of Various Polyparylenes Deposited by Conventional and Plasma-Enhanced Chemical Vapour Deposition G. Franz, S.F. Dribinskiy, Munich University of Applied Sciences, Germany, D. Voss, Plasma-Parylene Coating Services, Germany |
PS3-TuP13 Plasma and Surface Characterisation in the Pulsed Polymerisation of Acrylic Acid Films J.W. Bradley, S. Voronin, University of Liverpool, UK, M.R. Alexander, University of Nottingham, UK |
PS3-TuP15 Nanopantography: A New Approach for Massively Parallel Fabrication of Nano-Structures M.K. Jain, L. Xu, S.C. Vemula, S.K. Nam, V.M. Donnelly, D.J. Economou, P. Ruchhoeft, University of Houston |