AVS 53rd International Symposium
    Plasma Science and Technology Tuesday Sessions
       Session PS3-TuP

Paper PS3-TuP9
Chemical Modification of the Poly(Vinylidene Fluoride-Trifluoroethylene) Surface through Fluorocarbon Ion Beam Deposition

Tuesday, November 14, 2006, 6:00 pm, Room 3rd Floor Lobby

Session: Advanced Plasma Deposition Poster Session
Presenter: W.-D. Hsu, University of Florida
Authors: W.-D. Hsu, University of Florida
I. Jang, University of Florida
S.B. Sinnott, University of Florida
Correspondent: Click to Email
Classical molecular dynamics simulations are used to study the effects of continuous fluorocarbon (FC) ion beam deposition on a poly(vinylidene fluoride-trifluoroethylene), P(VDF-trFE), surface. Fluorocarbon plasma processing is widely used to chemically modify surfaces and deposit thin films. It is well-accepted that polyatomic ions and neutrals within low-energy plasmas have a significant effect on the surface chemistry induced by the plasma. The deposition of mass selected fluorocarbon ions is useful to isolate the effects specific to polyatomic ions. This research focuses on the differences in the chemical interactions of C@sub 3@F@sub 5@@super +@ ions and CF@sub 3@@super +@ ions with P(VDF-trFE) surface. The incident energy of the ion beams is 50 eV/ion. The CF@sub 3@@super +@ ions are predicted to be more effective at fluorinating the P(VDF-trFE) surface than C@sub 3@F@sub 5@@super +@ ions. At the same time, the C@sub 3@F@sub 5@@super +@ ions are predicted to be more effective in growth of fluorocarbon thin film. The simulations also reveal possible mechanisms that could produce these differences, which will be discussed. This work is supported by the National Science Foundation (Grant number CHE-0200838).