| AVS 64th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-TuP1 Particle Kinetic Simulation of Low-temperature Low-pressure HiPIMS Plasma N.T. Lauer, Natale Ianno, University of Nebraska-Lincoln |
| PS-TuP2 QDB: the Quantemol Database of Plasma Processes C. Hill, S. Rahimi, D.B. Brown, Anna Dzarasova, J.R. Hamilton, S. Zand-Lashani, Quantemol LTD, UK, J. Tennyson, University College London, UK |
| PS-TuP3 Self-neutralized Ion Beam by Pulsed Plasma with Synchronous Afterglow Bias Ya-Ming Chen, R. Sawadichai, V.M. Donnelly, D.J. Economou, University of Houston |
| PS-TuP4 Gold Nanoparticle Catalyst for Plasma Nitridation of Thin Films Takeshi Kitajima, Y. Kariya, T. Nakano, National Defense Academy of Japan, Japan |
| PS-TuP5 Development of Microwave Resonant Probes for Measurement of Plasma Density Bo-Jr Chen, Y.C. Wu, J.S. Chiou, K.C. Leou, National Tsing Hua University, Taiwan, Republic of China |
| PS-TuP7 Molecular Dynamics Simulation of Ni Self-sputtering and Modeling of Interatomic Potential Functions Nicolas Mauchamp, M. Isobe, S. Hamaguchi, Osaka University, Japan |
| PS-TuP8 Atomic Layer Etching of Silicon Dioxide Using Alternating C4F8 and Energetic Ar+ Plasma Beams S. Kaler, Q. Lou, V.M. Donnelly, Demetre Economou, University of Houston |
| PS-TuP9 Si, SiO2, and Si3N4 Etching Characteristics of Silicon Halide Ions (SiFx+, SiClx+, and SiBrx+) Kazuhiro Karahashi, T. Ito, H. Li, Y. Muraki, Osaka University, Japan, M. Matsukuma, Tokyo Electron Limited, Japan, S. Hamaguchi, Osaka University, Japan |
| PS-TuP10 The Interactions of Atmospheric Pressure Plasma Jets with Surfaces: In Situ Measurements of Local Excitations in Thin Films Eric Gillman, Naval Research Laboratory, B.M. Foley, J. Tomko, University of Virginia, D.R. Boris, S.C. Hernández, Naval Research Laboratory, A. Giri, University of Virginia, Tz.B. Petrova, G.M. Petrov, Naval Research Laboratory, P.E. Hopkins, University of Virginia, S.G. Walton, Naval Research Laboratory |
| PS-TuP11 Modeling of a Plasma Discharge in an ICP Plasma Source for a Strip Tool Vladimir Nagorny, Mattson Technology, Inc., V.V. Olshansky, Kharkiv Institute of Physics and Technology, Ukraine, S. Ma, Mattson Technology, Inc. |
| PS-TuP12 Characterization of Ion Lasers with Paschen Curves Steven Flores, San Jose State University and Coherent Inc., C. Fields, Coherent Inc. |
| PS-TuP13 Plasma Simulation of Capacitively Coupled Plasma for High Aspect Ration Contact Process of Semiconductor Hyowon Bae, Samsung Electronics Co. Ltd., J. Kim, Pusan National University, Republic of Korea, M. Lin, Hanyang University, Republic of Korea, J. Um, S. Han, T. Kang, Samsung Electronics Co. Ltd., H.J. Lee, Pusan National University, Republic of Korea |
| PS-TuP14 N2, O2, and NF3 Dissociation in a Low Frequency, High Density Plasma Source Hanyang Li, Y. Zhou, V.M. Donnelly, University of Houston, K. Wenzel, J. Chiu, J. Lamontagne, X. Chen, MKS Instruments, Inc. |
| PS-TuP16 Improvement of Adhesion Strength between Copper and Composite Materials using Plasma Press Method DooSan Kim, W.O. Lee, J.W. Park, M.K. Mun, K.S. Kim, K.H. Kim, Y.J. Ji, J.S. Oh, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| PS-TuP17 Experimental and Simulation Study on Hydrogen Atom Kinetics in Low-pressure Capacitively Coupled Plasmas S. Nunomura, K. Katayama, Isao Yoshida, National Institute of Advanced Industrial Science and Technology (AIST), Japan |
| PS-TuP18 Effect of Superimposed Multi-frequency on Plasma Characteristics of an Inductively Coupled Plasma Source Kyung Chae Yang, H.S. Lee, S.G. Kim, D.I. Sung, M.K. Mun, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| PS-TuP19 Numerical Simulation of Capacitively Coupled Radio Frequency Plasma Discharges - Effect of Hollow Cathode Structure Hsin-Chang Chang, C.Y. Chen, P.S. Luo, K.C. Leou, National Tsing Hua University, Taiwan, Republic of China |
| PS-TuP20 Photocatalytic Effects of Ag-TiO2 Nanotubes Fabricated by BCP Lithography G.Y. Yeom, Dain Sung, J.S. Oh, K.C. Yang, D.W. Kim, Sungkyunkwan University, Republic of Korea |
| PS-TuP21 Prediction of Particle Generation by Machine Learning in Plasma Etching Tools Yoshito Kamaji, Hitachi High-Technologies Corp., Japan, M. Sumiya, A. Kagoshima, Hitachi High-Technologies Corp., M. Izawa, Hitachi High-Technologies Corp., Japan |
| PS-TuP22 Investigation of Wear-Resistance Enhancement of Plasma-functionalized Carbon-nanotube Composite Polyurethane Film Daisuke Ogawa, H. Uchida, K. Nakamura, Chubu University, Japan |
| PS-TuP23 Dynamics of Power-Modulated Chlorine Plasmas Tianyu Ma, T. List, P. Arora, Y. Zhou, V.M. Donnelly, University of Houston, S. Nam, Samsung Electronics, Republic of Korea |
| PS-TuP25 Investigation of Electromagnetic Effects in Very High Frequency Linear Plasma Source Xiaopu Li, K. Bera, J.A. Kenney, S. Rauf, K.S. Collins, Applied Materials, Inc. |
| PS-TuP26 Modeling of High-Density Magnetically Enhanced Inductive Plasmas Generated by Symmetrical Solenoid Coils Bocong Zheng, M. Shrestha, Q.H. Fan, Michigan State University |
| PS-TuP27 Plasma Modeling in the OpenFOAM Framework A.K. Verma, Venkattraman Ayyaswamy, University of California Merced |
| PS-TuP29 The Role of Charge Exchange Collisions in Selective Etching of Si Sergey Voronin, P. Biolsi, TEL Technology Center, America, LLC, A. Ranjan, Tokyo Electron Miyagi Limited, Japan |
| PS-TuP30 Development of an Aluminum Nitriding Process using Electrostatic Plasma Mass Spectroscopy and Energy Analysis and In Vacuuo Auger Electron Spectroscopy Christopher Muratore, m-Nanotech Ltd., University of Dayton, A. Korenyi-Both, Tribologix Inc. |
| PS-TuP31 A New Transformer Model for Solenoidal ICP Discharge Expandable to Low Density Plasma Jang-Jae Lee, S.J. Kim, K.-K. Kim, Y.S. Lee, S.J. You, Chungnam National University, Republic of Korea |
| PS-TuP32 Development of a Novel VI Sensor for RF Power Measurement Kwang-Ki Kim, S.J. You, Chungnam National University, Republic of Korea |
| PS-TuP33 Transmission Line Model of Cutoff Probe Si-Jun Kim, J.-J. Lee, K.-K. Kim, Y.S. Lee, Chungnam National University, Republic of Korea, D.W. Kim, Korea Institute of Machinery and Materials, Republic of Korea, J.H. Kim, Korea Institute of Standards and Science, Republic of Korea, S.J. You, Chungnam National University, Republic of Korea |
| PS-TuP34 Fault Detection in Radio-frequency Plasma Processing using Voltage-current (VI) Probes and Statistical Models Thomas Gilmore, Impedans Ltd, Ireland |
| PS-TuP35 Finding Adequate Global Model of Non-Maxwellian Distribution based on PIC Simulation Young-Seok Lee, S.J. Kim, J.-J. Lee, S.J. You, Chungnam National University, Republic of Korea |