| AVS 64th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
| Session PS-TuP |
| Session: | Plasma Science and Technology Poster Session |
| Presenter: | Si-Jun Kim, Chungnam National University, Republic of Korea |
| Authors: | S.J. Kim, Chungnam National University, Republic of Korea J.-J. Lee, Chungnam National University, Republic of Korea K.-K. Kim, Chungnam National University, Republic of Korea Y.S. Lee, Chungnam National University, Republic of Korea D.W. Kim, Korea Institute of Machinery and Materials, Republic of Korea J.H. Kim, Korea Institute of Standards and Science, Republic of Korea S.J. You, Chungnam National University, Republic of Korea |
| Correspondent: | Click to Email |
to low electron density regime(< 1010 cm-3). In order to supplement the circuit model we introduced TL model and compared results between TL model and three-dimensional full-wave electromagnetic(3-D FWEM) simulation. Simulation
results of TL model are in good agreement with that of the a 3-D FWEM simulation in both low and high electron density regime. Furthermore the results of TL model are the same with that of circuit model in the low electron density
regime. Therefore by using TL model we can expand the applicable range of cutoff probe up to high electron density regime.