AVS 64th International Symposium & Exhibition
    Plasma Science and Technology Division Tuesday Sessions
       Session PS-TuP

Paper PS-TuP35
Finding Adequate Global Model of Non-Maxwellian Distribution based on PIC Simulation

Tuesday, October 31, 2017, 6:30 pm, Room Central Hall

Session: Plasma Science and Technology Poster Session
Presenter: Young-Seok Lee, Chungnam National University, Republic of Korea
Authors: Y.S. Lee, Chungnam National University, Republic of Korea
S.J. Kim, Chungnam National University, Republic of Korea
J.-J. Lee, Chungnam National University, Republic of Korea
S.J. You, Chungnam National University, Republic of Korea
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The electron energy probability function (EEPF) is usually assumed to be Maxwell distribution for 0-D global model. Meanwhile, it is well-known that the form of EEPF of Ar plasma changes from bi-Maxwellian to Druyvesteyn as the gas pressure increases. Thus, to apply the 0-D global model of Maxwellian distribution to the non-Maxwellian plasma, we weighted up the relative contribution of two distinct electrons with different temperatures. The contributions of cold/hot electrons to the power and particle balance were investigated by comparing the result of the global model considering all combinations of electron temperatures with that of 1-D particle-in-cell Monte Carlo collision (PIC-MCC) simulation and the result of investigations was analyzed physically. Furthermore, predictions consistent with PIC-MCC simulation for variations of the contribution of cold/hot electrons at different pressures and driving currents are presented.