| AVS 64th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
| Session PS-TuP |
| Session: | Plasma Science and Technology Poster Session |
| Presenter: | Tianyu Ma, University of Houston |
| Authors: | T. Ma, University of Houston T. List, University of Houston P. Arora, University of Houston Y. Zhou, University of Houston V.M. Donnelly, University of Houston S. Nam, Samsung Electronics, Republic of Korea |
| Correspondent: | Click to Email |
Studies of power-modulated chlorine inductively-coupled plasmas will be presented. Power at 13.56 MHz applied to the plasma was modulated between a high power and low power state. This allows optical emission and actinometry with trace added Ar to be carried out during the entire period, unlike traditional pulsed plasmas where no power is input during the “low power” state. Optical emission spectra were recorded over the 200 to 900 nm region where emissions from Cl, Cl2, SiCl, SiCl2, SiCl3 and Ar occur. The intensity of Cl-to-Ar emission, proportional to Cl number density, was strongly modulated, allowing Cl recombination coefficients to be obtained from a simple model. Langmuir probe measurements were also recorded. The plasma was found to operate in one of two modes. When power was dropped from high to low, ether 1) the plasma density and optical emission intensities quickly dropped to a lower level that then remained constant, or 2) the density dropped to a very low level, emission ceased for a rather long time until re-ignition occurred. Whether the plasma operates in mode 1 or 2 is sensitive to settings on the matching network and is also a function of pressure and modulation frequency.
Work supported by Samsung Electronics.