AVS 66th International Symposium & Exhibition


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Atomic Scale Processing Focus Topic Sessions

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Start Time Session Code Session Title
Monday 8:20am AP+2D+EM+PS+TF-MoM Area Selective Deposition and Selective-Area Patterning
Monday 1:40pm 2D+AP+EM+MI+MN+NS+PS+TF-MoA Nanostructures including Heterostructures and Patterning of 2D Materials
Monday 1:40pm 2D+AP+EM+MI+NS+PS+TF-MoA 2D Materials Growth and Fabrication
Monday 1:40pm TF+2D+AP+EL+SS-MoA ALD and CVD: Nucleation, Surface Reactions, Mechanisms, and Kinetics
Tuesday 8:00am EM+2D+AP+NS+PS-TuM New Devices and Materials for Electronics and Photonics
Tuesday 8:00am TF+AP-TuM ALD and CVD: Precursors and Process Development
Tuesday 2:20pm AP+EL+MS+PS+SS+TF-TuA Advancing Metrology and Characterization to enable Atomic Layer Processing
Wednesday 8:00am AP+BI+PS+TF-WeM Surface Reaction Analysis and Emerging Applications of Atomic Scale Processing
Thursday 8:00am AP+PS+TF-ThM Thermal Atomic Layer Etching
Thursday 2:20pm SS+2D+AP+AS+OX+SE-ThA Dynamics at Surfaces/Reactions and Imaging of Oxide Surfaces
Thursday 6:30pm AP-ThP Atomic Scale Processing Poster Session

AVS 66th International Symposium & Exhibition