AVS 66th International Symposium & Exhibition
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Atomic Scale Processing Focus Topic Sessions
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Start Time
Session Code
Session Title
Monday 8:20am
AP+2D+EM+PS+TF-MoM
Area Selective Deposition and Selective-Area Patterning
Monday 1:40pm
2D+AP+EM+MI+MN+NS+PS+TF-MoA
Nanostructures including Heterostructures and Patterning of 2D Materials
Monday 1:40pm
2D+AP+EM+MI+NS+PS+TF-MoA
2D Materials Growth and Fabrication
Monday 1:40pm
TF+2D+AP+EL+SS-MoA
ALD and CVD: Nucleation, Surface Reactions, Mechanisms, and Kinetics
Tuesday 8:00am
EM+2D+AP+NS+PS-TuM
New Devices and Materials for Electronics and Photonics
Tuesday 8:00am
TF+AP-TuM
ALD and CVD: Precursors and Process Development
Tuesday 2:20pm
AP+EL+MS+PS+SS+TF-TuA
Advancing Metrology and Characterization to enable Atomic Layer Processing
Wednesday 8:00am
AP+BI+PS+TF-WeM
Surface Reaction Analysis and Emerging Applications of Atomic Scale Processing
Thursday 8:00am
AP+PS+TF-ThM
Thermal Atomic Layer Etching
Thursday 2:20pm
SS+2D+AP+AS+OX+SE-ThA
Dynamics at Surfaces/Reactions and Imaging of Oxide Surfaces
Thursday 6:30pm
AP-ThP
Atomic Scale Processing Poster Session
AVS 66th International Symposium & Exhibition