| AVS 66th International Symposium & Exhibition | |
| Atomic Scale Processing Focus Topic | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| AP-ThP1 Atomic Resolution Characterization of Atomic Layer Etching Normally-off AlGaN/GaN Hetrostructure Device by Using Aberration-corrected STEM Chien-Nan Hsiao, Taiwan Instrument Research Institute, National Applied Research Laboratories, Taiwan, Republic of China, C.P. Lin, C.C. Chen, M.H. Chan, W.-C. Chen, F.Z. Chen, National Applied Research Laboratories, Taiwan, Republic of China |
| AP-ThP2 Programmable Radical-Assisted Sputtering Enabling Designed Deposition Processes with Atomic Layer Accuracy Hideo Isshiki, Y. Tanaka, The University of Electro-Communications, Japan, S. Saisho, Shincron Co. LTD., Japan |