AVS 59th Annual International Symposium and Exhibition, Session PS2-TuM

AVS 59th Annual International Symposium and Exhibition
Plasma Science and Technology	Tuesday Sessions

Session PS2-TuM
Advanced FEOL/Gate Etching 2

Tuesday, October 30, 2012, 8:00 am, Room 25
Moderator: J.P. Chang, University of California at Los Angeles

Click here to Download program book for this session
in Adobe Acrobat format

Click a paper to see the details. Presenters are shown in bold type.

8:00am	PS2-TuM1 Gate-Silicon Etching using Evanescent Microwave Plasma for 22nm Technology Node and Beyond A. Ranjan, S. Voronin, H. Kintaka, K. Kumar, P. Biolsi, Tokyo Electron Technology Center, America, LLC, R. Jung, S. Kanakasabapathy, International Business Machines – Research Group, A. Banik, IBM T.J. Watson Research Center
8:20am	PS2-TuM2 Tracking Line Width Roughness Improvement during Gate Plasma Patterning L. Vallier, E. Pargon, CNRS, France, N. Posseme, CEA, LETI, MINATEC Campus, France, L. Azarnouche, CNRS, France, S.D. Nemani, C. Rosslee, T. Pham, Applied Materials Inc.
8:40am	PS2-TuM3 Invited Paper Plasma Prize Talk: Grand Challenges in Etch R. Gottscho, S. Sriraman, Lam Research
9:20am	PS2-TuM5 Spacer Patterning for Trigate SOI Devices S. Barnola, P. Pimenta-Barros, L. Desvoivres, J. Pradelles, S. Barraud, CEA, LETI, MINATEC Campus, France
9:40am	PS2-TuM6 Key Challenges in FinFET FEOL RIE Processing at the 14nm CMOS Node and Beyond R.M. Martin, A. Banik, J. Chang, R. Jung, S. Kanakasabapathy, M. Kobayashi, Q. Lin, B.G. Morris, S.C. Seo, T. Standaert, K. Stein, R. Sreenivasan, H. Wang, M. Yang, Q. Yang, Y. Yin, IBM Corporation, D.H. Choi, R. Kambhampati, T. Kwon, GLOBALFOUNDRIES
10:40am	PS2-TuM9 Patterning Options for 14nm Node and Beyond Y. Yin, R. Jung, F. Lie, M. Beard, B.G. Morris, M. Hartig, S. Kanakasabapathy, IBM Res. at Albany Nanotech, Y. Mignot, STMicroelectronics, Y. Xu, C. Koay, IBM Res. at Albany Nanotech, L. Jang, GLOBALFOUNDRIES, N. Saulnier, J. Abdallah, H. Chen, IBM Res. at Albany Nanotech, M. Tagami, Renesas Electonics, K. Akarvardar, S. Akarvardar, GLOBALFOUNDRIES, J. Arnold, T. Spooner, M. Colburn, IBM Res. at Albany Nanotech
11:00am	PS2-TuM10 High-Efficiency Downstream Plasma Processes L. Diao, R. Elliston, A. Kadavanich, C. Lee, V. Nagorny, H. PhanVu, O. Todor, V. Vaniapura, Mattson Technology
11:20am	PS2-TuM11 Challenges for Sub 20nm STI Etch H. Zhou, X. Ji, S. Srinivasan, J. He, X. Hua, D. Heo, J. Choi, A. Khan, A. Agarwal, S. Rauf, Applied Materials Inc.