| AVS 59th Annual International Symposium and Exhibition | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-MoM1 Selective Etching of Spacer with Pulsing in Inductively Coupled Plasmas for FinFET Devices B. Zhou, M. Titus, P. Friddle, M. Robson, G. Upadhyaya, G. Kamarthy, Lam Research Corp, S. Kanakasabapathy, E. Franke, IBM Corp |
| 8:40am | PS-MoM2 Evaluation of Novel Spacer Etch Processes using a New Gas S. Engelmann, E.A. Joseph, N.C.M. Fuller, W.S. Graham, E.M. Sikorski, IBM T.J. Watson Research Center, M. Nakamura, G. Matsuura, Zeon Chemicals L.P., H. Matsumoto, A. Itou, T. Suzuki, Zeon Corporation |
| 9:00am | PS-MoM3 Invited Paper Anisotropic and Selective Etching of Novel Multifunctional Materials J.P. Chang, University of California, Los Angeles |
| 9:40am | PS-MoM5 High Selective Etching of SiN Based Material Over Si and SiO2 using Evanescent Microwave Plasma for FINFET Spacer Applications A. Raley, A. Ranjan, H. Kintaka, B. Messer, T. Mori, K. Kumar, P. Biolsi, Tokyo Electron Technology Center, America, LLC, A. Inada, Renesas Electronics, R. Jung, S. Kanakasabapathy, International Business Machines – Research Group |
| 10:00am | PS-MoM6 Highly Selective and Controllable Si3N4 Etching to Si and SiO2 for sub-22-nm Gate Spacer using CF3 Neutral Beam with O2 and H2 D. Nakayama, A. Wada, T. Kubota, Tohoku University, Japan, M. Haass, R.L. Bruce, R.M. Martin, N.C.M. Fuller, IBM TJ Watson Research Center, S. Samukawa, Tohoku University, Japan |
| 10:40am | PS-MoM8 Highly Selective Etching of Titanium Nitride Over Tantalum Nitride in Inductively Coupled Plasma W. Zhu, H. Shin, S. Sridhar, L. Liu, V.M. Donnelly, D.J. Economou, University of Houston, C. Lenox, T. Lii, Texas Instruments |
| 11:20am | PS-MoM10 Detailed Analysis of Si Substrate Damage Induced by HBr/O2- and H2-Plasma Etching and the Recovery Process Designs Y. Nakakubo, A. Matsuda, Kyoto University, Japan, M. Fukasawa, Sony Corporation, Japan, Y. Takao, Kyoto University, Japan, T. Tatsumi, Sony Corporation, Japan, K. Eriguchi, K. Ono, Kyoto University, Japan |
| 11:40am | PS-MoM11 Time-modulated Plasma Etching for Next Generation Devices S. Sriraman, Y. Wu, G. Kamarthy, C. Rusu, J. Holland, A. Paterson, V. Vahedi, Lam Research |