| AVS 52nd International Symposium | |
| Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-TuP1 Aluminum Nitride formed by Expanding Thermal Arc Plasma Chemical Vapor Depositon G.T. Dalakos, H. Marek, GE Global Research Center |
| PS-TuP2 Study of Deposition Precursors in Amorphous Silicon Nitride Film Deposited by Plasma CVD Y. Ichikawa, M. Narita, Fuji Electric Device Technology, Japan, S. Fujikake, Fuji Electric Advanced Technology, Japan |
| PS-TuP3 Deposition of SiOxNy Films by PE-CVD for OLED Passivation J.H. Lee, C.H. Jeong, J.T. Lim, J.H. Lim, S.-J. Kyung, G.Y. Yeom, Sungkyunkwan University, Korea |
| PS-TuP4 Linearized Process Model Analysis As a Means of Understanding the Behavior of the Reactive Sputtering Process D.J. Christie, Advanced Energy Industries, Inc. |
| PS-TuP6 Stabilization of the Atmospheric Glow Plasma E. Aldea, P. Peeters, Eindhoven University of Technology, The Netherlands, H. de Vries, Fuji Photofilm B.V, M.C.M. Van De Sanden, Eindhoven University of Technology, The Netherlands |
| PS-TuP8 Frequency and Dimensional Scaling of Microplasmas Generated by Microstrip Transmission Lines I. Rodriguez, J. Hopwood, Northeastern University |
| PS-TuP9 Effect of Gas Flow on the Gas Temperature in a High Pressure DC Micro-discharge F. Doll, Q. Wang, V.M. Donnelly, D.J. Economou, University of Houston, G.F. Franz, University of Applied Sciences, Germany |
| PS-TuP10 Plasma-Deposited Silver Containing Nanocomposite Coatings with Bactericidal Properties P. Favia, University of Bari, IMIP-CNR, Plasma Solution Srl, Italy, E. Sardella, M. Nardulli, University of Bari, Italy, R. Gristina, Institute of Inorganic Methodologies and Plasmas (CNR-IMIP) Bari, R. d’Agostino, University of Bari, IMIP-CNR, Plasma Solution Srl, Italy |
| PS-TuP13 Functionalization of Rough Polymer Surfaces and Porous Micron-Sized Beads Using Atmospheric Pressure Plasmas@footnote 1@ A.N. Bhoj, University of Illinois at Urbana-Champaign, M.J. Kushner, Iowa State University |
| PS-TuP14 Plasma Simulation for Plasma-based Ion Implantation Sterilization Technique T. Tanaka, Hiroshima Institute of Technology, Japan, M. Tanaka, PEGASUS Software Inc., Japan, D. Nakamura, TWO CELL CO. Ltd., Japan, H. Fukuyama, Kobe Steel Ltd., Japan, T. Takagi, Hiroshima Institute of Technology, Japan |
| PS-TuP15 Extraction and Collimation of Laser Photoionized Neodymium Ion Beam K.T. Tamura, Japan Atomic Energy Research Institute |
| PS-TuP16 Time-Dependent Recombination Reactions of Oxygen Atoms on an Anodized Aluminum Plasma Reactor Wall, Studied by a Spinning Wall Method P.F. Kurunczi, J. Guha, V.M. Donnelly, University of Houston |
| PS-TuP17 Effect of Coulomb Collision on Oxygen Plasma K. Nanbu, T. Furubayashi, Tohoku University, Japan |
| PS-TuP18 The Role of Ar Metastables in Distorting Gas Temperature Measurements Derived from Trace N@sub 2@ Optical Emission Rotational Spectroscopy in Ar-Containing Discharges S.J. Kang, V.M. Donnelly, University of Houston |
| PS-TuP19 PLAD Dopant Depth Profile Based on Ion Mass and Energy Distribution for Ultra Low Energy Implantation L. Godet, S. Walther, S. Radovanov, Z. Fang, J. Scheuer, VSEA, G. Cartry, C. Cardinaud, Nantes University, France |
| PS-TuP21 Characteristics of Inductively Coupled Plasma Source with a Multiple U-Type Internal Antenna for Flat Panel Display Applications K.N. Kim, C.K. Oh, G.Y. Yeom, Sungkyunkwan University, Korea |
| PS-TuP22 Electron Density Measurements with Surface Wave Probes in Magnetized Plasmas K. Nakamura, Chubu University, Japan, S. Yajima, H. Sugai, Nagoya University, Japan |
| PS-TuP23 Optical Emission Measurements of Dual Frequency Capacitively Coupled Plasmas E.C. Benck, K.L. Steffens, National Institute of Standards and Technology |
| PS-TuP24 Characterization of an Energetic Neutral Beam Source C. Helmbrecht, Q. Wang, V.M. Donnelly, D.J. Economou, University of Houston, G.F. Franz, University of Applied Sciences, Germany |
| PS-TuP25 Helicon Discharges with Permanent Magnets H. Torreblanca, F.F. Chen, University of California, Los Angeles |
| PS-TuP26 Discharge Electrode Impedance Effect on Harmonics Generation Y. Yamazawa, M. Nakaya, M. Iwata, A. Shimizu, Tokyo Electron AT LTD, Japan |
| PS-TuP27 Electron Beam-Generated Plasmas Produced in Nitrogen and Applications to Materials Processing S.G. Walton, D. Leonhardt, R.F. Fernsler, US Naval Research Laboratory, C. Muratore, US Air Force Research Laboratory |
| PS-TuP29 A High Density Negative Ion Plasma in a Very High Dielectric-Constant Discharge Tube Y. Ikeda, KYOSERA Co. LTD., Japan, K. Endo, H. Shindo, Tokai University, Japan |