AVS 52nd International Symposium
    Plasma Science and Technology Tuesday Sessions
       Session PS-TuP

Paper PS-TuP21
Characteristics of Inductively Coupled Plasma Source with a Multiple U-Type Internal Antenna for Flat Panel Display Applications

Tuesday, November 1, 2005, 4:00 pm, Room Exhibit Hall C&D

Session: Plasma Science and Technology Poster Session
Presenter: K.N. Kim, Sungkyunkwan University, Korea
Authors: K.N. Kim, Sungkyunkwan University, Korea
C.K. Oh, Sungkyunkwan University, Korea
G.Y. Yeom, Sungkyunkwan University, Korea
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The development of large-area and/or large-volume plasma source with a high plasma density is desired for various plasma processes from microelectronic fabrication processes to flat panel display device fabrication processes. The plasma sources developed to date for the production of high-density and large-area plasmas are mainly focused on the externally planar ICP. However, scaling up to a conventional spiral-type external plasma sources to a large area sources causes some problems when they are applied to TFT-LCD, and by inserting an antenna into the plasma, more production applicable large area ICP is feasible due to the induction of a strong electric field in the plasma and the efficient power transmission to the plasma. In this study, an internal type large-area plasma source with U-type internal linear- antennas has been proposed as a promising candidate for an efficient high-density plasma source. The characteristics of the plasmas were measured using a Langmuir probe located on the sidewall of the chamber. The results showed a strong dependence of the plasma characteristics such as plasma density and plasma uniformity on the antenna arrangement.