AVS 52nd International Symposium
    Plasma Science and Technology Tuesday Sessions
       Session PS-TuP

Paper PS-TuP3
Deposition of SiOxNy Films by PE-CVD for OLED Passivation

Tuesday, November 1, 2005, 4:00 pm, Room Exhibit Hall C&D

Session: Plasma Science and Technology Poster Session
Presenter: J.H. Lee, Sungkyunkwan University, Korea
Authors: J.H. Lee, Sungkyunkwan University, Korea
C.H. Jeong, Sungkyunkwan University, Korea
J.T. Lim, Sungkyunkwan University, Korea
J.H. Lim, Sungkyunkwan University, Korea
S.-J. Kyung, Sungkyunkwan University, Korea
G.Y. Yeom, Sungkyunkwan University, Korea
Correspondent: Click to Email
To prevent the permeation of H@sub 2@O and O@sub 2@ to the devices, the encapsulation of the devices such as metal encapsulation and glass encapsulation are currently used for OLED devices, however, thin film passivation instead of the encapsulation on these devices are preferred for the lighter weight, wider viewing angle, flexibility, etc. Therefore, various permeation barrier materials and various deposition methods for these materials are intensively investigated for the passivation of the next generation flexible flat panel display (FPD) devices such as OTFTs and OLEDs. In this study, bis(tertiary-butylamino)silane (BTBAS) was used as the precursor of Si, SiO@sub x@N@sub y@ thin films were deposited on plastic substrates at a low temperature using a PECVD method and its properties were investigated. BTBAS was used as the precursor of Si because it shows a low impurity content after the deposition and it is safe, easy to handle as a liquid form, and chemically stable compared to other silicon precursors such as SiH@sub 4@, SiH@sub x@Cl@sub y@, etc. Also, by forming multiple layers of SiO@sub x@N@sub y@/parylene, the water permeation properties of the deposited SiO@sub x@N@sub y@ films were also investigated. In this presentation, we will report the deposited film characteristics for an OLED passivation layer such as deposition rate, film crystallization, chemical composition, H@sub 2@O permeation, and optical transmittance measured using an alpha-step, XPS, FT-IR, ellipsometer, and UV spectrometer, respectively.