AVS 61st International Symposium & Exhibition

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Materials Characterization in the Semiconductor Industry Focus Topic Sessions

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Start Time Session Code Session Title
Monday 8:20am MC+AP+AS-MoM Characterization of 3D Structures, 2D films and Interconnects
Monday 8:20am AS+MC-MoM Quantitative Surface Analysis
Monday 2:00pm MC+2D+AP+AS-MoA Characterization of III-Vs (2:00-3:20 pm)/Photovoltaics, EUV masks, etc. (3:40-4:40 pm)
Monday 2:00pm AS+BI+MC+SS-MoA The Liquid Interface & Depth Profiling and Sputtering with Cluster Ion Beams
Tuesday 8:00am IS+AS+MC+SS-TuM Ambient Pressure X-ray Photoelectron Spectroscopy (AP-XPS)
Tuesday 2:20pm 2D+AS+HI+MC+NS+PS+SP+SS-TuA 2D Materials Characterization including Microscopy and Spectroscopy 
Tuesday 2:20pm AS+MC+SS-TuA Analysis of Modified Surfaces
Tuesday 2:20pm IS+AS+MC+SS-TuA Environmental Electron Microscopies
Tuesday 6:30pm MC-TuP Poster Session for all areas of Materials Characterization in the Semiconductor Industry
Wednesday 8:00am AS+BI+MC-WeM Chemical Imaging in 2D and 3D
Wednesday 8:00am IS+AS+MC+SS-WeM In-Situ X-ray Absorption and Raman Spectroscopy
Wednesday 2:20pm AS+BI+MC-WeA Practical Surface Analysis I
Wednesday 2:20pm IS+2D+MC+NS+SP+SS-WeA In-Situ Scanning Microscopy
Thursday 8:00am AP+AS+MC+NS+SS-ThM APT Analysis of Semiconductors, Magnetic and Oxide Materials
Thursday 8:00am HI+2D+AS+BI+MC-ThM Fundamental Aspects and Imaging with the Ion Microscope
Thursday 8:00am SP+2D+AS+EM+MC+NS+SS-ThM Probing Electronic and Transport Properties
Thursday 2:20pm EL+AS+EM+MC+SS-ThA Optical Characterization of Nanostructures and Metamaterials
Thursday 2:20pm HI+2D+AS+MC-ThA Nanoengineering with Helium Ion Beams
Friday 8:20am AS+MC+SS-FrM Practical Surface Analysis II

AVS 61st International Symposium & Exhibition