| AVS 61st International Symposium & Exhibition | |
| Helium Ion Microscopy Focus Topic | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | HI+2D+AS+MC-ThA1 Invited Paper Helium Ion Microscopy (HIM) Technology for Imaging, Characterization, and nano-Fabrication for nano-Device Materials and Structures Shinichi Ogawa, NeRI, AIST, Japan |
| 3:00pm | HI+2D+AS+MC-ThA3 MEMS Temperature Controlled Sample Stage for the Helium Ion Microscope Jose Portoles, P.J. Cumpson, Newcastle University, UK |
| 3:20pm | HI+2D+AS+MC-ThA4 Monte Carlo Simulations of Focused Neon Ion Beam Induced Sputtering of Copper Rajendra Timilsina, P.D. Rack, The University of Tennessee Knoxville, S. Tan, R.H. Livengood, Intel Corporation |
| 4:00pm | HI+2D+AS+MC-ThA6 Invited Paper Circuit Edit Nanomachining Study using Ne+ & He+ Focused Ion Beam Richard Livengood, S. Tan, Intel Corporation |
| 4:40pm | HI+2D+AS+MC-ThA8 Evaluation of EUV Resist Performance below 20-nm CD using Helium Ion Lithography D.J. Maas, TNO Technical Sciences, Netherlands, Nima Kalhor, TU Delft, Netherlands, W. Mulckhuyse, E. van Veldhoven, TNO Technical Sciences, Netherlands, A. van Langen–Suurling, P.F.A. Alkemade, TU Delft, Netherlands, S. Wuister, R. Hoefnagels, C. Verspaget, J. Meessen, T. Fliervoet, ASML, Netherlands |
| 5:00pm | HI+2D+AS+MC-ThA9 Helium Ion Beam Lithography for Nanoscale Patterning X. Shi, University of Southampton, UK, D.M. Bagnall, University of New South Wales, UK, Stuart Boden, University of Southampton, UK |
| 5:20pm | HI+2D+AS+MC-ThA10 Sub-100nm Nanofabrication using Helium and Neon Ion Beams James Sagar, C. Nash, N. Braz, T. Wootton, M.J.L. Sourribes, T.-T. Nguyen, R.B. Jackman, P.A. Warburton, London Centre for Nanotechnology, UK |