| AVS 61st International Symposium & Exhibition | |
| Materials Characterization in the Semiconductor Industry Focus Topic | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | MC+2D+AP+AS-MoA1 High Resolution SIMS Depth Profiling in III-V Compound Semiconductors Marinus Hopstaken, M.S. Schamis, Y. Sun, A. Majumdar, C.-W. Cheng, B.A. Wacaser, G. Cohen, K.K. Chan, D.K. Sadana, D.-G. Park, E. Leobandung, IBM T.J. Watson Research Center |
| 2:20pm | MC+2D+AP+AS-MoA2 Nitrogen Incorporation in Dilute Nitride III-V Semiconductors Measured by Resonant Nuclear Reaction Analysis and Ion Beam Channeling John Demaree, S.P. Svensson, W.L. Sarney, US Army Research Laboratory |
| 2:40pm | MC+2D+AP+AS-MoA3 Determination of Growth Conditions for Highly Mismatched Alloys, Using In Situ Auger Electron Spectroscopy and Flux grading Stefan Svensson, W.L. Sarney, US Army Research Laboratory, M. Ting, K.M. Yu, Lawrence Berkeley National Laboratory, L.W. Calley, Staib Instruments, Inc. |
| 3:00pm | MC+2D+AP+AS-MoA4 Electron Channeling Contrast Imaging: Examining Dislocation Effects in III-Ns J.K. Hite, U.S. Naval Research Laboratory, P. Gaddipati, American Society for Engineering Education, Michael Mastro, C.R. Eddy, D.J. Meyer, U.S. Naval Research Laboratory |
| 3:40pm | MC+2D+AP+AS-MoA6 EUV Lithography Mask Cleaning Applications of TOF SIMS Analysis Thomas Laursen, S.W. Novak, SUNY College of Nanoscale Science and Engineering, A. Rastegar, SEMATECH, T. Nakayama, SUNY College of Nanoscale Science and Engineering |
| 4:00pm | MC+2D+AP+AS-MoA7 Characterization of Ag/CuInSe2 Thin-Film Photovoltaics by Photoelectron Spectroscopy Pinar Aydogan, Bilkent University, Turkey, N. Johnson, A. Rockett, University of Illinois at Urbana-Champaign, S. Suzer, Bilkent University, Turkey |
| 4:40pm | MC+2D+AP+AS-MoA9 Facile Synthesis of Composition Tuned Cu1-xZnxO Nanoarchitecture on Alpha-Brass Y. Myung, Sriya Banerjee, Washington University, St. Louis, H. Im, J. Park, Korea University, S. Raman, Physical Electronics Inc., P. Banerjee, Washington University, St. Louis |
| 5:00pm | MC+2D+AP+AS-MoA10 In-line Dimensional Measurement via Simultaneous Small Spot XPS and XRF for Cu CMP Process Control B. Lherron, ST Microelectronics, Wei Ti Lee, Revera, Motoyama, Chao, Deprospo, Kim, IBM |
| 5:20pm | MC+2D+AP+AS-MoA11 Imaging of the Native Inversion Layer on Silicon-on-Insulator via Scanning Surface Photovoltage; Implications for RF harmonic generation Daminda Dahanayaka, IBM, A. Wong, Dartmouth College, P. Kaszuba, L. Moszkowicz, R. Wells, F. Alwine, IBM, L.A. Bumm, University of Oklahoma, R. Phelps, J. Slinkman, IBM |