AVS 61st International Symposium & Exhibition, Session AS+BI+MC+SS-MoA

AVS 61st International Symposium & Exhibition
Applied Surface Science	Monday Sessions

Session AS+BI+MC+SS-MoA
The Liquid Interface & Depth Profiling and Sputtering with Cluster Ion Beams

Monday, November 10, 2014, 2:00 pm, Room 316
Moderators: Ian Gilmore, National Physical Laboratory, Michaeleen Pacholski, The Dow Chemical Company

Click here to Download program book for this session
in Adobe Acrobat format

Click a paper to see the details. Presenters are shown in bold type.

2:00pm	AS+BI+MC+SS-MoA1 Invited Paper Quantifying the Impact of Curvature, Convection and Complexity on Dynamic Interfacial Tension of Fluid-fluid Interfaces Lynn Walker, Carnegie Mellon University
2:40pm	AS+BI+MC+SS-MoA3 In Situ Probing of Liquid Surfaces and Interfaces by Time-of-Flight Secondary Ion Mass Spectrometry Xiao-Ying Yu, Pacific Northwest National Laboratory
3:00pm	AS+BI+MC+SS-MoA4 Mass Spectrometric Characterization of Droplet Surfaces at Ambient Pressure Kaveh Jorabchi, Georgetown University
3:40pm	AS+BI+MC+SS-MoA6 Invited Paper Organic Depth Profiling Alchemy: Can We Transmute Data into Meaning? Alexander Shard, National Physical Laboratory, UK
4:20pm	AS+BI+MC+SS-MoA8 Argon Clusters - A Novel Solution for the Depth Profiling of Metal Alloys and Inorganic Materials Jonathan Counsell, H.L. Brannon, S.J. Coultas, S.J. Hutton, A.J. Roberts, C.J. Blomfield, Kratos Analytical Limited, UK
4:40pm	AS+BI+MC+SS-MoA9 Low Temperature Plasma for Crater Edge Depth Profiling of Crosslinking Organic Multilayers: Comparison with C₆₀ and Argon Cluster Sputter Sources Shin Muramoto, National Institute of Standards and Technology (NIST), D. Rading, ION-TOF GmbH, Germany, B. Bush, G. Gillen, National Institute of Standards and Technology (NIST), D.G. Castner, University of Washington
5:00pm	AS+BI+MC+SS-MoA10 Desorption/Ionization induced by Neutral Cluster Impact as a Versatile Tool for the Investigation of Sensitive and Complex Biosamples A. Portz, Justus Liebig University, Germany, M. Baur, University of Applied Sciences, Germany, C.R. Gebhardt, Bruker Daltonik GmbH, Germany, Michael Durr, Justus Liebig University, Germany
5:20pm	AS+BI+MC+SS-MoA11 C₆₀ and Argon Gas Cluster Ion Sputter Depth Profiling for Quantitative Inorganic Thin Film Analysis Saad Alnabulsi, G.L. Fisher, S.R. Bryan, J.S. Hammond, J.F. Moulder, Physical Electronics Inc.