VT-ThP1
Design and Construction of a Vacuum Tube Furnace with High Voltage Field for the Growth of Silicon Nanowires
C.A. Adams, J.J. Register, University of South Florida |
VT-ThP2
Experimental Measurements of Thermal Accommodation Coefficients for Microscale Gas-Phase Heat Transfer
W.M. Trott, D.J. Rader, J.N. Castañeda, J.R. Torczynski, M.A. Gallis, Sandia National Laboratories, L.A. Gochberg, Novellus Systems, Inc. |
VT-ThP3
Sputter Deposition System for High Throughput Fabrication of Composition Spreads
J.M. Gregoire, R.B. van Dover, J. Jin, F.J. DiSalvo, H.D. Abruna, Cornell University |
VT-ThP4
How Does One Turn a Research-Based Molecular Beam Epitaxy System into a Reliable Training Tool?
M.-R. Padmore, E.I. Altman, V.E. Henrich, F. Walker, Yale University |
VT-ThP5
Vacuum Chamber Design at National Synchrotron Light Source II
J.-P. Hu, H.-C. Hseuh, C. Foerster, Brookhaven National Laboratory |
VT-ThP6
Viscosity and Diffusion Coefficient for a Gas Mixture Flow in a Tube, Valid Over the Whole Range of Knudsen Numbers
M. Vukovic, Tokyo Electron U.S. Holdings Inc. |
VT-ThP7
New Apparatus for Testing Hermetically Sealed Packages of Electronic Devices
M. Kinugawa, H. Kurokawa, S. Takagi, Mitsubishi Electric Corp., Japan, H. Kawata, Wave Technology Inc., Japan |
VT-ThP8
Optimization of a Multitarget Sputtering System for the Production of Magnetic Tunneling Junctions and Multilayers
A. Chiolerio, P. Martino, Politecnico di Torino, Italy |
VT-ThP9
Influence of the Adsorption Gas on Friction Coefficient and Wear Track.
A. Kasahara, M. Goto, Y. Pihosh, M. Tosa, NIMS, Japan |
VT-ThP10
Atomic Layer Deposition Reactor with In Situ Diagnostics for Studying Gas-Surface Interactions
V. Rai, B.N. Jariwala, S. Agarwal, Colorado School of Mines |
VT-ThP11
A Real Time Monitoring Method on the Decomposition Degree of MOCVD Precursor through an Ultrasonic Diagnosis Method
J.Y. Yun, S.W. Kang, D.J. Seong, KRISS, S. Korea |
VT-ThP12
Development of a Static Expansion Vacuum Standard at the National Institute of Standards and Technology
J.H. Chow, P.J. Abbott, National Institute of Standards and Technology |
VT-ThP13
Custom-Designed Very-High Vacuum Chamber for Growth of Large Area Silicon Nanowhiskers Arrays via an Ion-Enhanced Vapor-Liquid-Solid (VLS) Mechanism
M. Bettge, University of Illinois at Urbana-Champaign, D. Abraham, Argonne National Laboratory, S. Burdin, S. MacLaren, I. Petrov, E. Sammann, University of Illinois at Urbana-Champaign |
VT-ThP14
A Low Pressure Chemical Vapor Deposition (LPCVD) System Designed for Epitaxial Growth of 3C-SiC on Si
M.P. Orthner, F. Solzbacher, L.W. Rieth, E. Jung, University of Utah |
VT-ThP15
Method of Diagnosing Mechanical Endurance of Dry Vacuum Pumps to High Throughput Environment
J.Y. Lim, W.S. Cheung, Korea Research Institute of Standards and Science, B.H. Moon, Samsung Electronics Company, Korea, Y.H. Shin, Korea Research Institute of Standards and Science |
VT-ThP17
ISAC / SEBT Vacuum System at TRIUMF
I. Sekachev, D. Yosifov, TRIUMF, Canada |
VT-ThP18
In-situ Diagnosis using FT-IR Spectroscope System Installed at the Exhaust Line of the Chamber and the Characterization of Al Metal Films with a New Precursor
S.W. Kang, J.Y. Yun, D.J. Seong, Y.H. Shin, Korea Research Institute of Standards and Science, I.D. Yang, J.Y. Shim, J.C. Oh, Quleap, S. Korea |
VT-ThP19
Consideration for the Role of Surface Boundary Layer and the Mechanism of Hydrogen Desorption in Stainless Steel
K. Akaishi, University of Toyama, Japan |