AVS 54th International Symposium
    Vacuum Technology Thursday Sessions
       Session VT-ThP

Paper VT-ThP18
In-situ Diagnosis using FT-IR Spectroscope System Installed at the Exhaust Line of the Chamber and the Characterization of Al Metal Films with a New Precursor

Thursday, October 18, 2007, 5:30 pm, Room 4C

Session: Vacuum Technology Poster Session (including Student Poster Competition with Cash Award)
Presenter: S.W. Kang, Korea Research Institute of Standards and Science
Authors: S.W. Kang, Korea Research Institute of Standards and Science
J.Y. Yun, Korea Research Institute of Standards and Science
D.J. Seong, Korea Research Institute of Standards and Science
Y.H. Shin, Korea Research Institute of Standards and Science
I.D. Yang, Quleap, S. Korea
J.Y. Shim, Quleap, S. Korea
J.C. Oh, Quleap, S. Korea
Correspondent: Click to Email

In-situ Fourier transform infrared (FT-IR) spectroscope system was installed at the exhaust line of the chamber to monitor the by-products generated by gas phase reaction and surface reaction. The by-products of Al metal precursor (a new one) were changed as a function of deposition temperature and pressure and so on (deposition condition). The intensity of spectra measured at the exhaust line was also varied as a measured condition. In in-situ FT-IR spectroscopy studies vibrational spectroscopy reveals the gain and loss of the by-products as a function of the deposition condition. The behavior of the functional group (such as N-C, C-C, C-H, etc.) was monitored and from that, the temperature dependence of the film properties (ex: the film composition) could be explained. The basic properties of a new Al precursor will be introduced.