AVS 54th International Symposium | |
Vacuum Technology | Thursday Sessions |
Session VT-ThP |
Session: | Vacuum Technology Poster Session (including Student Poster Competition with Cash Award) |
Presenter: | J.Y. Yun, KRISS, S. Korea |
Authors: | J.Y. Yun, KRISS, S. Korea S.W. Kang, KRISS, S. Korea D.J. Seong, KRISS, S. Korea |
Correspondent: | Click to Email |
This study proposes a method for monitoring the decomposition state of the metal-organic precursor which is used for the Metal Organic Chemical Vapor Deposition (MOCVD) system. As the precursor of MOCVD is highly likely to decompose due to the instability of its chemical structure during processing, critical problems are generated for thin film formation and its yield in this case. Although real time monitoring technology on the decomposition degree of these precursors is essential for the next generation semiconductor process, both commercialized technology and fundamental research have scarcely been accomplished. Therefore, this study endeavors for acknowledgement by the semiconductor industry with a proposal for a real time monitoring method on the decomposition degree of the precursor through an ultrasonic diagnosis method.