| AVS 63rd International Symposium & Exhibition | |
| Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS-MoM1 Novel Etch Strategies for Sidewall Image Transfer Sonam Sherpa, P. Chan, A. Ranjan, Tokyo Electron Ltd. |
| 8:40am | PS-MoM2 Enhancing Fin Retention in Low-K Spacer Etch Processes Using a Highly Selective Etch Chemistry N.P. Marchack, IBM Research Division, T.J. Watson Research Center, E. Miller, IBM Research at Albany Nanotech, R.L. Bruce, H. Miyazoe, E.M. Sikorski, Sebastian Engelmann, E.A. Joseph, IBM Research Division, T.J. Watson Research Center, S. Kanakasabapathy, IBM Research at Albany Nanotech |
| 9:00am | PS-MoM3 Effect of the Amount of Hydrogen During SiN etching on Etching Properties Nobuyuki Kuboi, H. Minari, M. Fukasawa, Y. Zaizen, J. Komachi, T. Kawamura, T. Tatsumi, Sony Corporation, Japan |
| 9:20am | PS-MoM4 Dual Channel Si/SiGe Fin patterning for 10nm Node and Beyond Fee Li Lie, E. Miller, P. Xu, S. Sieg, M. Sankarapandian, IBM Research, S. Schmitz, P. Friddle, Lam Research Corporation, G. Karve, J. Strane, IBM Research, K.Y. Lim, K. Akarvardar, M.G. Sung, GLOBALFOUNDRIES, Inc., S. Kanakabasapathy, IBM Research |
| 9:40am | PS-MoM5 Invited Paper Computational Patterning and Process Emulation: Linchpins to Enable Continued Scaling through Design Technology Co-optimization for Advanced Nodes Derren Dunn, IBM Corporation |
| 10:40am | PS-MoM8 Overcoming Challenges of sub-10NM FinFET Gate Etching in Halogenated Plasmas. Sergey Voronin, TEL Technology Center, America, LLC, J.R. Sporre, S. Kanakasabapathy, International Business Machines – Research Division, A. Ranjan, TEL Technology Center, America, LLC |
| 11:00am | PS-MoM9 Gate Etch Challenges Introduced by FinFET Gate Pitch Scaling John Sporre, IBM Research Division, X. Liu, IBM Research Division, T.J. Watson Research Center, S. Seo, IBM Research Division, C. Prindle, GLOBALFOUNDRIES, Inc., P. Montanini, IBM Research Division, R. Xie, GLOBALFOUNDRIES, Inc., M. Sankarapandian, S. Mehta, M. Breton, S. McDermott, S. Kanakasabapathy, IBM Research Division, B. Haran, IBM Research |
| 11:20am | PS-MoM10 Hybrid Fin reveal for tight Fin Pitch Technologies Peng Xu, IBM Research Division, P. Wang, Lam Research Corporation, Z.X. Bi, IBM Semiconductor Technology Research, T. Devarajan, IBM Research Division, B. Nagabhirava, A. Basavalingappa, Lam Research Corporation, F.L. Lie, J. Strane, M. Sankarapandian, S. Mehta, R. Conti, IBM Research Division, M. Goss, LAM Research Corporation, D. Canaperi, D. Guo, S. Kanakasabapathy, IBM Research Division |
| 11:40am | PS-MoM11 Damage Free Plasma Etching Processes for the Patterning of InGaAs fin for the sub-10nm Technological Node Maxime Bizouerne, E. Pargon, LTM, Univ. Grenoble Alpes, CEA-LETI, France, P. Burtin, CEA, LETI, MINATEC Campus, France, C. Petit-Etienne, E. Latu-Romain, S. Labau, M. Martin, LTM, Univ. Grenoble Alpes, CEA-LETI, France |