| AVS 59th Annual International Symposium and Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-ThP1 Vanadium Oxide Thin Films Grown by ALD using TEMAV and O3 or H2O Precursors A. Premkumar, IMEC, Belgium, M. Toeller, Tokyo Electron Limted, Japan, I. Radu, Katholieke Universitiet, Leuven, Belgium, C. Adelmann, M. Schaekers, J. Meersschaut, T. Conard, J. Malgorzata, S. Van Elshocht, IMEC, Belgium |
| TF-ThP2 Roles of MoO3 Layer for Charge Injection and Charge Generation in an Organic Light Emitting Diode M. Kawamura, S. Yoshida, Y. Abe, Kitami Institute of Technology, Japan |
| TF-ThP4 Effects of Preparation Conditions on the Magnetocaloric Effect of Gd Thin Films H.F. Kirby, D.D. Belyea, J.T. Willman, University of South Florida, C.G. Hendryx, Newsome High School, C.W. Miller, University of South Florida |
| TF-ThP5 Advanced Analytical Characterization of Multilayered Thin Films for Corrosion Inhibition G. Zorn, M. Karadge, GE Global Research, C.C. Pierce, J.I. Melzer, GE Power & Water, M.M. Morra, GE Global Research |
| TF-ThP6 Sputter Deposition of Atomically Smooth ZnO Films with Buffer Layers Crystallized via Nitrogen Mediation K. Kuwahara, Kyushu University, Japan |
| TF-ThP7 Influence of Substrate Temperature on the Microstructure and Surface Morphology of Pulsed DC Magnetron Sputtered ZrB2 Films C.T. Lee, W.C. Chen, Instrument Technology Research Center, Taiwan, Republic of China |
| TF-ThP8 Effect of Fluorine Doping on the Structural, Optical and Electrical Properties of CdS Films Deposited by Chemical Bath Deposition K.E. Nieto-Zepeda, Cinvestav-IPN, Mexico, E. Mota-Pineda, ESIME-IPN, Mexico, M.A. Zapata-Torres, CICATA-Legaria, IPN, Mexico, M.A. Melendez-Lira, Cinvestav-IPN, Mexico |
| TF-ThP9 Interfacial Properties of Atomic Layer Deposited TiO2 Films on InAs (100) Surfaces L. Ye, T. Gougousi, UMBC |
| TF-ThP10 AES and XPS Characterizations in ALD ZnO Films Doped with Al and P H. Yuan, Northwestern Polytechnical University, China, B. Luo, W.L. Gladfelter, S.A. Campbell, University of Minnesota |
| TF-ThP12 Photoluminescence and Life-Time Characterization of Polythiophene Incorporated with Dye Molecules H. Kobe, H. Kato, A. Yamada, S. Takemura, T. Hiramatsu, K. Shimada, K. Matsui, Kanto Gakuin University, Japan |
| TF-ThP13 Production of Miniaturized Optical Interference Filters Array for CMOS Sensor C.-N. Hsiao, P.-K. Chiou, H.-P. Chen, B.-H. Liao, Y.-W. Lin, F.-Z. Chen, Instrument Technology Research Center, Taiwan |
| TF-ThP14 Analysis of Thin Layers with Low Energy Ion Scattering (LEIS) B. Hagenhoff, M. Fartmann, D. Breitenstein, Tascon GmbH, Germany, T. Grehl, ION-TOF GmbH, Germany, H.R.J. ter Veen, Tascon GmbH, Germany |
| TF-ThP15 Reaction Mechanism for the Atomic Layer Deposition of Titanium Dioxide using Titanium Tetrachloride and Titanium Tetraisopropoxide as Precursors R.P. Chaukulkar, S. Agarwal, Colorado School of Mines |
| TF-ThP16 Nitrogen Doped Zinc Oxide Thin Films Prepared by Reactive RF Magnetron Sputtering of Zinc in Nitrous Oxide Atmosphere and Post-deposition Annealing Structural and Optical Properties L.A. Hernández-Hernández, ESFM-IPN, Mexico, A. Hernández-Hernández, F. De Moure-Flores, J.G. Quiñones-Galván, CINVESTAV-IPN, Mexico, J.J. Araiza-Ibarra, UAF-UAZ, Mexico, M. Meléndez-Lira, CINVESTAV-IPN, Mexico |
| TF-ThP17 Physical and Electrical Characteristic of Atomic Layer Deposition of AlxHfyOz on Silicon Y. lin, W. Li, S. Fanz, R. Candler, UCLA |
| TF-ThP18 Wetting Properties of Silicon Incorporated DLC Films T.G. Kim, Pusan National University, Korea |