AVS 59th Annual International Symposium and Exhibition
    Thin Film Thursday Sessions
       Session TF-ThP

Paper TF-ThP13
Production of Miniaturized Optical Interference Filters Array for CMOS Sensor

Thursday, November 1, 2012, 6:00 pm, Room Central Hall

Session: Thin Film Poster Session
Presenter: C.-N. Hsiao, Instrument Technology Research Center, Taiwan
Authors: C.-N. Hsiao, Instrument Technology Research Center, Taiwan
P.-K. Chiou, Instrument Technology Research Center, Taiwan
H.-P. Chen, Instrument Technology Research Center, Taiwan
B.-H. Liao, Instrument Technology Research Center, Taiwan
Y.-W. Lin, Instrument Technology Research Center, Taiwan
F.-Z. Chen, Instrument Technology Research Center, Taiwan
Correspondent: Click to Email
Optical interference filters designed for use in a space-grade multispectral assembly in a complementary metal-oxide–semiconductor sensor were deposited on fused silica by ion-beam-assisted deposition. The optical parameters of optical interference coatings were optimized using admittance loci analysis. The patterned multispectral assembly containing blue, green, red, near infrared, and panchromatic multilayer high/low alternated dielectric band-pass filter arrays in a single chip was fabricated by photolithography process. The corresponding properties of the films were investigated by in situ optical monitoring, elipsometry, spectrometry, scanning electron microscopy and high resolution scanning transmittance microscopy. It was found that the optical properties were significantly improved by employing ion-beam-assisted deposition . The average transmittances were above 90 % for the multispectral assembly, with a rejection transmittance of less than 1% in the spectral range 350–1100 nm. To estimate the optical stability of optical coatings for aerospace applications, a space environment assuming a satellite orbiting the Earth at an altitude of near 780 kilometers was simulated by a Co60 gamma (g) radiation test.