| AVS 57th International Symposium & Exhibition | |
| Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-TuP1 Etching Characteristics of Ge2Sb2Te5 in Chemical Effects for the Phase-Change Memory Applications J.T. Cheong, H.M. Lee, J.S. Yang, H.C. Jung, H.C. Lee, Y.S. Sohn, H.S. Kang, Hynix Semiconductor |
| PS-TuP2 Etch Characteristics of TiN for Metal/High-k Gate Stack using Inductively Coupled Plasma J.-S. Park, J.-C. Woo, C.-I. Kim, Chung-Ang University, Republic of Korea |
| PS-TuP3 Etch Characteristics of HfAlO3 Thin Films in High Density Plasma T.-K. Ha, J.-C. Woo, C.-I. Kim, Chung-Ang University, Republic of Korea |
| PS-TuP4 The Dry Etching of ITO Thin Films on Glass for Flat Panel Displays J.H. Wi, J.-C. Woo, C.-I. Kim, Chung-Ang University, Republic of Korea |
| PS-TuP5 Effect of N2/Ar Flow Rates on Surface Roughness during High Speed Thinning of Si Wafer using F Radicals and NO Gas W. Heo, N.-E. Lee, Sungkyunkwan University, Republic of Korea |
| PS-TuP6 Modelling of the Silica Glass Etching under ICP SF6/Ar Plasma Discharge L. Lallement, A. Rhallabi, M.C. Fernandez, C. Cardinaud, Institut des Materiaux Jean Rouxel, France |
| PS-TuP9 Highly Selective and Low Damage Etching of TiN on HfO2 Layer Gate Stack Structure using HBr/Cl2 Neutral Beam J.K. Yeon, W.S. Lim, Y.Y. Kim, B.J. Park, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| PS-TuP10 Atomic Scale Etch Depth Control and Low Damage Etching of III-V Compound Materials using Cl2 Atomic-Layer Etching Y.Y. Kim, W.S. Lim, J.K. Yeon, T.H. Kim, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| PS-TuP11 Surface Model for Profile Simulation of SiO2 Etching in Fluorocarbon Gas Chemistry T.Y. Yagisawa, T.M. Makabe, Keio University, Japan |
| PS-TuP12 General Approach to Feature Profile Evolution via Monte Carlo Simulations P.E. Moroz, TEL US Holdings, P. Miller, HFS |
| PS-TuP13 Warm Magnetized Vlasov Emission Equilibria R.E. Terry, Naval Research Laboratory (retired) |
| PS-TuP14 Inductive Plasmas in Cl2/Ar : Comparison of Hybrid Model Results with Experimental Measurements J.-P. Booth, E. Despiau-Pujo, R. Sarot, P. Chabert, CNRS-LPP, France, L. Gatilova, S. Bouchoule, CNRS-LPN, France |
| PS-TuP15 Computer Simulation of a Controllable Electron Beam Exciter D. Urrabazo, M.J. Goeckner, S. Thamban, University of Texas at Dallas, G. Padron-Wells, University of Texas ar Dallas |
| PS-TuP16 Numerical Simulations of a Magnetron Plasma Sputtering System using VORPAL C.M. Roark, C. Zhou, P.H. Stoltz, Tech-X Corporation |
| PS-TuP18 An Experimental Demonstration of Real-time Closed-loop Control of a Capacitively Coupled Argon Oxygen Plasma Y. Zhang, B. Keville, A. Holohan, M. Turner, S. Daniels, Dublin City University, Ireland |
| PS-TuP19 Real Time Closed Loop Control of Plasma Processing B. Keville, M. Turner, S. Daniels, Y. Zhang, A. Holohan, Dublin City University, Ireland |
| PS-TuP20 Adhesion Improvement of DLC Films on Polymer Substrates S.-M. Baek, T. Shirafuji, S.-P. Cho, N. Saito, O. Takai, Nagoya University, Japan |
| PS-TuP22 2m Long-Linear Plasma Production by Microwave in a Narrowed Rectangular Waveguide with a Long Slot Antenna H. Shindo, Y. Kimura, Tokai University, Japan |