AVS 57th International Symposium & Exhibition | |
Plasma Science and Technology | Tuesday Sessions |
Session PS-TuP |
Session: | Plasma Science and Technology Poster Session |
Presenter: | H. Shindo, Tokai University, Japan |
Authors: | H. Shindo, Tokai University, Japan Y. Kimura, Tokai University, Japan |
Correspondent: | Click to Email |
Long line-shaped plasmas are inevitable in material processing in manufacturing industries, such as solar cell film CVD, flat panel displays (FPDs), and various surface modification of large-area thin films. In this work, a newly proposed method of large-scaled line plasma production is studied. In this method, microwave power of frequency of 2.45 GHz in a narrowed and flattened rectangular waveguide is employed to produce a long uniform line plasma. Since the width of waveguide is very close to the cutoff condition, the wavelength of microwave inside the guide is very much lengthened, providing a condition of long line high density plasma with a great uniformity.
The narrowed rectangular wave-guide of 1.0 and 2.0 m in length and 5mm in height were prepared and the width of the waveguide is 62.0 to 61.5 mm which is very closed to the cut-off condition. The waveguide has a long slot on the top surface to launch the micro-wave into the discharge plasma chamber of 1.0 and 2.0 m in length. At the end of wave guide, a short plunger was quipped to adjust the phase of the standing microwave, hence the uniformity of the plasma thus produced. The plasmas of Ar at the pressures of 100 to 500 mTorr were produced by employing an extremely long microwave wavelength. The plasma thus produced was three-dimensionally measured by a Langmuir probe.