| AVS 53rd International Symposium | |
| Thin Film | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-TuP1 Effect of Particle Transport Process on Mode Transition and Film Composition during Reactive Sputtering of Metal Oxides T. Nakano, Y. Iimura, S. Baba, Seikei University, Japan |
| TF-TuP2 Hydrogen Uptake in MgO Thin Films Grown by Reactive Magnetron Sputtering J.S. Agustsson, Mentis Cura ehf, Iceland, B.V. Agustsson, Royal Institute of Technology, Sweden, A.K. Eriksson, University of Iceland, K.B. Gylfason, Lyfjathroun Biopharmaceuticals, Iceland, S. Olafsson, University of Iceland, K. Johnsen, Mentis Cura ehf, Iceland, J.T. Gudmundsson, University of Iceland |
| TF-TuP3 Structure and Electronic Properties of Molybdenum Oxide Thin Films Fabricated by DC Magnetron Sputtering V.V. Atuchin, B.M. Ayupov, T.A. Gavrilova, T.I. Grigorieva, V.A. Kochubey, Institute of Semiconductor Physics, C.V. Ramana, U. Becker, University of Michigan |
| TF-TuP4 Transparent Conducting AZO Thin Films Prepared by Magnetron Sputtering with DC and RF Power Applied in Combination T. Minami, Y. Ohtani, T. Miyata, T. Kuboi, Kanazawa Institute of Technology, Japan |
| TF-TuP5 Effect of Target Density and Sputtering Parameters on Film Structure and Resistivity of Tungsten C.F. Lo, Praxair Surface Technologies - MRC |
| TF-TuP6 Combinatorial Synthesis and Characterization of Magnetic Fe@sub x@Al@sub 1-x@N Thin Films for Biomedical Applications Y. Guan, P.D. Rack, The University of Tennessee, Knoxville, X. Wang, Y. Liu, Alfred University, K.D. Sorge, Florida Atlantic University |
| TF-TuP7 Investigation of Luminescence and Microstructure of Sputter-deposited Zinc Gallate Thin Films Doped with Manganese J.H. Kim, Chungbuk National University, Korea, P.H. Holloway, University of Florida |
| TF-TuP8 Compositional Characterization of High-k Dielectric Material via XPS and TOF-ERDA D. Martin, J. Enlund, O. Kappertz, J. Jensen, Uppsala University, Sweden |
| TF-TuP9 Transparent Conducting Amorphous ZnO-In@sub 2@O@sub 3@ Films Deposited on PC or PET Substrate T. Moriga, H. Suketa, K. Takita, D. Takada, K. Shimomura, K. Inoue, K. Murai, K. Tominaga, The University of Tokushima, Japan |
| TF-TuP10 Thermophysical Properties and Electrical Properties of Amorphous In@sub 2@O@sub 3@-ZnO Films T. Ashida, A. Miyamura, Y. Sato, Y. Shigesato, Aoyama Gakuin University, Japan, T. Yagi, N. Taketoshi, T. Baba, National Institute of Advanced Industrial Science and Technology, Japan |
| TF-TuP11 Transparent Conductive Oxide Films of In2O3-ZnO with Additional Ga2O3 Impurities K. Tominaga, D. Takada, H. Suketa, K. Takita, K. Shimomura, K. Inoue, K. Murai, T. Moriga, The University of Tokushima, Japan |
| TF-TuP12 High Resistive ZnO Thin Films Sputtered from ZnO@sub 2@-doped ZnO Target K. Wasa, Kyoto University, Japan, Y.J. Shan, Utsunomiya University, Japan, I. Kanno, T. Suzuki, Kyoto University, Japan |
| TF-TuP13 Abnormal Resistivity Change in Indium-Tin Oxide Films S. Takayama, Hosei University, Japan |
| TF-TuP14 Multi-layered Depleted Uranium and Gold Coatings on Cylindrical Substrates H. Wilkens, General Atomics, J.L. Klingmann, Lawrence Livermore National Laboratory, A. Nikroo, D.R. Wall, J.R. Wall, General Atomics |
| TF-TuP15 Nano-Composite Amorphous Carbon (a-C) Thin Films to Improve the Tribological Properties Y.S. Park, H.J. Cho, B. Hong, Sungkyunkwan University, Korea |
| TF-TuP16 Preliminary Study of CuIn@subx@B@sub1-x@Se@sub2@ Absorber Materials N.J. Ianno, T. Santero, R.J. Soukup, University of Nebraska-Lincoln |
| TF-TuP17 Lubricant Characteristics of Ti doped Hydrogenated Amorphous Carbon Films Prepared by Closed-Field Unbalanced Magnetron Sputtering Method H.J. Cho, Y.S. Park, B. Hong, Sungkyunkwan University, Korea |
| TF-TuP18 Anisotropic Microstructure of PVD Coatings Caused by Anisotropy in Flux Distribution of Arriving Atoms S.Yu. Grachev, J.-D. Kamminga, Netherlands Institute for Metals Research, the Netherlands, T. Smy, Carleton University, Canada, G.C.A.M. Janssen, R. Machunze, Technical University Delft, the Netherlands |
| TF-TuP19 Comparative Study on Super-Hardcoating Materials between Ti@sub x@W@sub y@N and Ti@sub x@Al@sub y@Si@sub z@N Deposited by Reactive Co-Sputtering M. Yamaguchi, A. Miyamura, Aoyama Gakuin University, Japan, K. Hattori, National Institute of Advanced Industrial Science and Technology, Japan, T. Aoki, Y. Sato, Y. Shigesato, Aoyama Gakuin University, Japan |
| TF-TuP20 Target Surface Compound Layers Formed by Reactive Sputtering of Si Target in Ar+O@sub 2@ and Ar+N@sub 2@ Mixed Gases Y. Abe, T. Takisawa, M. Kawamura, K. Sasaki, Kitami Institute of Technology, Japan |
| TF-TuP21 Heat Treatment Effect in Palladium Oxide Composite Films Fabricated by Reactive Ion Beam Sputter-Deposition T. Ichinohe, S. Masaki, Tokyo National College of Technology, Japan, M. Iwase, Tokai University, Japan, K. Kawasaki, TDY, Co, Ltd., Japan |
| TF-TuP22 Theoretical and Experimental Study of Thin-Film Precursor Vaporization J. Peck, M.M. Litwin, Praxair, Inc. |
| TF-TuP23 Film Improvement of ALD TaN Layers by Application of Additional Energy D. Schmidt, C. Hossbach, M. Albert, Technische Universitaet Dresden, Germany, S. Menzel, Leibnitz Institute for Solide State and Materials Research Dresden, Germany, J.-W. Bartha, Technische Universitaet Dresden, Germany |
| TF-TuP24 Device-Quality SiO@sub 2@ Dielectric Film Formation using UV-light Excited High Purity Ozone and Organic Silicon Source at 200 @super o@C N. Kameda, T. Nishiguchi, S. Saitoh, T. Noyori, Y. Morikawa, M. Kekura, Meidensha Corporation, Japan, H. Nonaka, S. Ichimura, National Institute of Advanced Industrial Science and Technology (AIST), Japan |
| TF-TuP25 Preparation and Photocatalytic Activity of CdS/TiO@subX@N@subY@ Heterojunctions K. Prabakar, T. Takahashi, K. Takahashi, T. Nezuka, University of Toyama, Japan, T. Nakashima, Kashiwa Chuo High School, Japan, Y. Kubota, University of Yokohama City, Japan, A. Fujishima, Kanagawa Academy of Science and Technology, Japan |
| TF-TuP26 Ferroelectric Properties of Highly Oriented BLT Films using HfO@sub 2@ as Buffer Layers for Ferroelectric-Gate Field-Effect Transistors K.T. Kim, G.H. Kim, Chung-Ang University, Korea, C.I. Lee, Ansan College of Technology, Korea, C.I. Kim, Chung-Ang University, Korea |
| TF-TuP27 Zirconia in Sputter Deposited Oxide Nanolaminate Films: Interfacial Structures, Size Effects, and Metastable Phases C.R. Aita, R.S. Sorbello, University of Wisconsin-Milwaukee |