AVS 53rd International Symposium
    Thin Film Tuesday Sessions
       Session TF-TuP

Paper TF-TuP17
Lubricant Characteristics of Ti doped Hydrogenated Amorphous Carbon Films Prepared by Closed-Field Unbalanced Magnetron Sputtering Method

Tuesday, November 14, 2006, 6:00 pm, Room 3rd Floor Lobby

Session: Thin Film Poster Session
Presenter: H.J. Cho, Sungkyunkwan University, Korea
Authors: H.J. Cho, Sungkyunkwan University, Korea
Y.S. Park, Sungkyunkwan University, Korea
B. Hong, Sungkyunkwan University, Korea
Correspondent: Click to Email
Hydrogenated amorphous carbon (a-C:H) have been shown to have the low friction coefficient, high hardness and low abrasive wear rate. The a-C:H film according to experiments have had the maximum hardness of 25 GPa and the minimum friction coefficient of 0.1. The incorporation of Ti in a-C:H film is able to improve the electrical conductivity, friction coefficient and the adhesion to various substrates. In this study, a-C:H:Ti films were deposited on Si and steel substrates by closed-field unbalanced magnetron (CFUBM) sputtering system with two targets of carbon and titanium in Ar/C2H2 plasma. The lubricant characteristics was investigated for a-C:H:Ti deposited with DC bias voltage from 0 V to -300 V. We obtained the hardness up to 20 GPa and friction coefficient lower than 0.1. The atomic percentage of Ti related to the lubricant properties increased up to 11 % at -300 V. Also, the surface roughness and the surface energy of the films tended to reduce with the DC bias voltage. The surface roughness of the film was found to be extremely low (0.2 nm).These results might be due to the increase of the ions bombardment and Ti implantation with DC bias voltage.