| AVS 53rd International Symposium | |
| Applied Surface Science | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| AS-ThP1 TOF-SIMS Analysis of pH Dependent Structure of Protein-A Immobilized on ITO Coated Substrate N. Kato, M. Higuchi, Seikei University, Japan, S. Aoyagi, Shimane University, Japan, M. Kudo, Seikei University, Japan |
| AS-ThP2 ToF-SIMS as a Reliable Tool for Cyanobacterial Toxic Molecules Research C. Bittencourt, H. Sarmento, J.-P. Descy, J.-J. Pireaux, L. Houssiau, University of Namur, Belgium |
| AS-ThP3 High Resolution Mass Spectrometric Analysis of Non-Dehydrated Biological Samples H.F. Arlinghaus, J. M@um o@ller, C. Kriegeskotte, D. Lipinsky, Universit@um a@t M@um u@nster, Germany |
| AS-ThP4 Conformational Susceptibilities of Peptides at Interfaces W.K. Browne, R.L. York, O. Mermut, P.L. Geissler, G.A. Somorjai, University of California at Berkeley |
| AS-ThP5 Investigation of the Use of IR Ellipsometry for the Detection of Biological Molecules S. Sarkar, University of Nebraska |
| AS-ThP6 Surface Potential Imaging of Self-Organized DNAs acquired by Kelvin Probe Microscopy T. Ishizaki, N. Saito, O. Takai, Nagoya University, Japan |
| AS-ThP7 Surface Potential Measurement of Human Hair using Kelvin Probe Microscopy R. Lodge, B. Bhushan, The Ohio State University |
| AS-ThP8 Fabrication of Nanoscale Craters In PMMA Due to Exposure to Condensing Solvent Vapor C.M. Bates, S.C. Langford, J.T. Dickinson, Washington State University |
| AS-ThP9 Surface Characterization for MEH-PPV of Difference Molecular Weight Analyzed by XPS and SPM N. Keiichi, I. Yoshitoki, O. Toshiyuki, JEOL Ltd., Japan |
| AS-ThP10 Application of a Recent Algorithm to Patterned Polymer Overlayers S. Hajati, S. Tougaard, University of Southern Denmark, S.J. Coultas, C. Blomfield, Kratos Analytical Ltd, UK |
| AS-ThP12 Applications of ToF-SIMS in a Research and Development Laboratory V.S. Smentkowski, S.G. Ostrowski, GE-GRC-N |
| AS-ThP15 Doping Area Analysis using Atomic Force Microscopy in Si Devices K.-W. Kim, E.-J. An, K.-Y. Choi, S.-Y. Lee, Hynix Semiconductor Inc., Korea |
| AS-ThP16 Stress in FIB Exposed Si K.M. Archuleta, D.P. Adams, M.J. Vasile, Sandia National Labs, J.E. Fulghum, University of New Mexico, P.G. Kotula, Sandia National Labs |
| AS-ThP17 Quantification of Fe-Ni Alloy Films by XPS, AES and SIMS K.J. Kim, D.W. Moon, C.J. Park, H.J. Song, Korea Research Institute of Standards and Science, D. Simons, G. Gillen, National Institute of Standards and Technology, H. Jin, H.J. Kang, Chungbuk National University, Korea |
| AS-ThP18 Epitaxial Growth of NbN and MgO Films for Superconducting Single Photon Detectors and Josephson Junction Qubits J.S. Kline, S. Oh, R.H. Hadfield, A. Lita, S.W. Nam, D.P. Pappas, National Institute of Standards and Technology |
| AS-ThP19 Large-Area Pulsed-Laser-Deposition of Dielectric and Ferroelectric Thin Films S. Sakai, M. Takahashi, K. Motohashi, Y. Yamaguchi, N. Yui, T. Kobayashi, National Institute of Advanced Industrial Science and Technology, Japan |
| AS-ThP20 Ordered Au(111) Surfaces Grown on Si(111) K. Pedersen, A. Silva, Aalborg University, Denmark, P. Morgen, University of Southern Denmark, Z.S. Li, University of Aarhus, Denmark |
| AS-ThP21 Aluminum Induced Crystallization (AIC) of Amorphous Silicon H.M. Meyer, Oak Ridge National Laboratory, K. Sharif, H. Naseem, H.H. Abu-Safe, W.D. Brown, University of Arkansas |
| AS-ThP22 MD/MC Simulations of Reactive Sputtering Deposition of Amorphous SiO2 M. Taguchi, S. Hamaguchi, Osaka University, Japan |
| AS-ThP23 Development of Closed Field Reactive Magnetron Sputtering for Multilayer Optical Coating J.M. Walls, D.R. Gibson, E.M. Waddell, Applied Multilayers Ltd, UK |
| AS-ThP24 Advanced Process Modelling of the Rotating Magnetron O. Kappertz, T. Kubart, T. Nyberg, S. Berg, Uppsala University, Sweden |
| AS-ThP26 Decomposition of Titanium Deuteride Films Protected by Ultra-Thin Pd Layers; Thermal Desorption Kinetics Studies Combined with Microstructure Analysis of Bimetallic Films W. Lisowski, Polish Academy of Sciences, Poland, E.G. Keim, A.H.J. van den Berg, M.A. Smithers, University of Twente, The Netherlands, Z. Kaszkur, Polish Academy of Sciences, Poland |
| AS-ThP27 Photocatalytic Decomposition of CH@sub3@OH on TiO@sub2@ Sputter Films Prepared by Changing Ar/O@sub2@ Ratio and Working Gas Pressure T. Takahashi, K. Prabakar, University of Toyama, Japan, T. Nakashima, Kashiwa Chuo High School, Japan, Y. Kubota, University of Yokohama City, Japan, A. Fujishima, Kanagawa Academy of Science and Technology, Japan |
| AS-ThP28 A Short Review on the ESSCR Mechanism for Phosphor Degradation H.C. Swart, J.J. Terblans, E. Coetsee, O.M. Ntwaeaborwa, M.S. Dhlamini, University of the Free State, South Africa, P.H. Holloway, University of Florida |
| AS-ThP29 Synthesis and Characterization of Erbia Doped Metal Oxide Nanofibers for Applications in Thermophotovoltaics E.T. Bender, R. Wang, M.T. Aljarrah, E.A. Evans, R.D. Ramsier, The University of Akron |
| AS-ThP30 Complimentary Information from Auger and EDS Analyses of Particles and Thin Films S.A. Wight, NIST |
| AS-ThP31 Atom Probe Characterization of Thin FIlms D.J. Larson, Imago Scientific Instruments Corp |
| AS-ThP32 Relative Sputter Rates of Oxide Films: Constancy, Energy and Angle Dependence A.S. Lea, M.H. Engelhard, D.R. Baer, T. Droubay, P. Nachimuthu, Pacific Northwest National Laboratory |
| AS-ThP33 Transient Effects during Cs/Ga Dual Beam TOF-SIMS Profiling: Experiment and Simulation R.G. Vitchev, J. Brison, L. Houssiau, Facultes Universitaires Notre-Dame de la Paix, Belgium |
| AS-ThP34 Preliminary Report of Evaluation of Automated Peak Detection Procedure in X-ray Photoelectron Spectra M. Suzuki, ULVAC-PHI, Inc., Japan, S. Fukushima, S. Tanuma, NIMS, Japan |
| AS-ThP35 Calculations of Electron Inelastic Mean Free Paths In 12 Organic Compounds and 15 Inorganic Compounds Over the 50 - 30,000 eV Energy Range S. Tanuma, National Institute for Materials Science (NIMS), Japan, C.J. Powell, D.R. Penn, National Institute of Standards and Technology |
| AS-ThP36 Electron Energy Loss Function for Ultra-Thin HfO2, Al2O3 and Hf-Al-O Dielectric Films on Si(100) H. Jin, S.K. Oh, H.J. Kang, Chungbuk National University, Korea, S. Tougaard, University of Southern Denmark |