AVS 53rd International Symposium
    Applied Surface Science Thursday Sessions
       Session AS-ThP

Paper AS-ThP12
Applications of ToF-SIMS in a Research and Development Laboratory

Thursday, November 16, 2006, 5:30 pm, Room 3rd Floor Lobby

Session: Aspects of Applied Surface Science Poster Session
Presenter: V.S. Smentkowski, GE-GRC-N
Authors: V.S. Smentkowski, GE-GRC-N
S.G. Ostrowski, GE-GRC-N
Correspondent: Click to Email
Time of flight secondary ion mass spectrometry (ToF-SIMS) has a number of desirable characteristics for surface analysis in a research and development laboratory. In this presentation, we show the benefits of ToF-SIMS analysis via real industrial examples. We will show that ToF-SIMS is able to detect and image species that are below the detection limit for other analytical instruments. We will also show that depth profiles measured on ToF-SIMS instruments are comparable to depth profiles measured on dynamic SIMS instruments. One advantage of performing depth profiles using ToF-SIMS instrumentation is that an entire mass spectrum is saved at each depth and the analyst can perform retrospective analysis and/or multivariate statistical analysis of the entire measured depth profile data set in order to understand the material. In a research and development laboratory, the analyst does not always know a-priori which species should be monitored; we will show that advanced multivariate statistical analysis tools are useful for a complete analysis of the measured data.