AVS 53rd International Symposium
    Applied Surface Science Thursday Sessions
       Session AS-ThP

Paper AS-ThP17
Quantification of Fe-Ni Alloy Films by XPS, AES and SIMS

Thursday, November 16, 2006, 5:30 pm, Room 3rd Floor Lobby

Session: Aspects of Applied Surface Science Poster Session
Presenter: H. Jin, Chungbuk National University, Korea
Authors: K.J. Kim, Korea Research Institute of Standards and Science
D.W. Moon, Korea Research Institute of Standards and Science
C.J. Park, Korea Research Institute of Standards and Science
H.J. Song, Korea Research Institute of Standards and Science
D. Simons, National Institute of Standards and Technology
G. Gillen, National Institute of Standards and Technology
H. Jin, Chungbuk National University, Korea
H.J. Kang, Chungbuk National University, Korea
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Although XPS and AES are commonly used for the quantitative surface analysis of multi-component materials, quantitative analysis of alloy and compound materials is still difficult because of both the matrix effect occurring in quantification and the surface composition change by ion beam sputtering. Therefore, we need reference materials to ensure reliable analysis. It is more desirable that reference materials should minimize both the matrix effect and the surface composition change during ion sputtering for surface cleaning. Quantification of Fe-Ni alloy thin films was suggested as a new subject for a pilot study in the surface analysis working group of CCQM. Fe-Ni alloy thin films have been developed as the certified reference materials (CRM) for quantitative surface analysis by XPS and AES. Fe-Ni alloy films (Fe28 at%-Ni 72 at%, Fe51 at%-Ni 49 at%, Fe78 at%-Ni 22 at%) were grown on Si (100) wafers by ion beam sputter deposition. The relative compositions of the alloy films were controlled using in-situ XPS analysis. The nominal compositions of the CRMs were certified by inductively coupled plasma-mass spectrometry with the isotope dilution method. SIMS depth profiling using a C@sub 60@@super +@ ion source showed uniform depth distributions of relative compositions. The Fe concentrations of the three specimens selected from the center, medium and edge of the 6 inch wafer showed a good agreement within the relative standard deviation of 0.05 %. In this study, some preliminary results for the CCQM pilot study will be presented. The quantification of Fe-Ni alloy films was performed by XPS, AES and SIMS. Sputtering of Fe-Ni alloy films with 0.5 - 5 keV Ar ions showed no severe modification in surface compositions. For nominal surface composition and measured composition, the calibration curves of the alloy compositions by XPS, AES and SIMS showed almost identical slopes within the range of 1.01 - 1.03.