| AVS 50th International Symposium | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| PS-WeP1 Experiemental Study of Real-Time Feedback Control of Ion Energy and Ion flux in Poly-Si Etch Process Using High Density Cl@sub 2@ Plasmas K.C. Leou, C.H. Chang, C. Lin, National Tsing Hua University, ROC |
| PS-WeP3 Study of the Passivation Mechanisms Involved in the Silicon Deep Etching Cryogenic Process X. Mellhaoui, R. Dussart, A. Basillais, T. Tillocher, P. Lefaucheux, P. Ranson, GREMI, France |
| PS-WeP4 Etching Characteristics in Novel Internal Linear Inductively Coupled Plasma Antenna for Flat Panel Display Applications G.Y. Yeom, K.N. Kim, Y.J. Lee, Sung Kyun Kwan University, South Korea, B.U. Cho, J.K. Lee, Pohang University Science and Technology, Korea, M.A. Lieberman, University of California at Berkeley |
| PS-WeP6 Inductively Coupled Plasmas in Cl@sub 2@/O@sub 2@ Mixtures: Modeling and Experiment A.M. Efremov, Ivanovo State University of Chemistry and Technology, Russia, C.I. Kim, D.P. Kim, Chung-Ang University, Korea |
| PS-WeP8 Atomic Layer Etching of Silicon using a Low Angle Forward Reflected Ar Neutral Beam S.D. Park, D.H. Lee, G.Y. Yeom, Sungkyunkwan University, Korea |
| PS-WeP9 Molecular Beam Mass Spectrometry of the Microwave Discharge in Methane/Argon Gas Mixture M. Misina, P. Pokorny, Institute of Physics ASCR, Czech Republic |
| PS-WeP10 Spatio-temporal Characterization of Pulsed, Electron Beam Produced Plasmas S.G. Walton, D. Leonhardt, C. Muratore, D.D. Blackwell, R.F. Fernsler, R.A. Meger, Naval Research Laboratory |
| PS-WeP11 Experimental Characterization of a Pulsed Inductively Coupled Plasma C.H. Chang, K.C. Leou, S.J. Wu, M.L. Gong, T.L. Lin, National Tsing Hua University, ROC |
| PS-WeP12 Effect of Gas Heating in a High Density Pulsed Plasma Discharge D.J. Economou, S.K. Nam, University of Houston |
| PS-WeP13 A Model of Feature Profile Evolution for Nanometer-Scale Control of Etched Profiles and Critical Dimensions K. Ono, Y. Osano, A. Sano, K. Takahashi, Y. Setsuhara, Kyoto University, Japan |
| PS-WeP14 Selected Modifications of PE and PTFE Surfaces by Means of a Modified RF N@sub 2@ Plasma N. Vandencasteele, F. Reniers, Universite Libre de Bruxelles, Belgium |
| PS-WeP15 Principle of a Beam Profile Controlled Linear Ion Beam Source and Application Examples M. Nestler, D. Roth, Roth & Rau AG, Germany, F Scholze, M. Tartz, Institut f@um u@r Oberfl@um a@chenmodifizierung Leipzig e.V., Germany, M. Zeuner, Ion+Tech GmbH, Germany, H. Neumann, Institut f@um u@r Oberfl@um a@chenmodifizierung Leipzig e.V., Germany |
| PS-WeP16 Creation and Characteristics of Miniature Microwave Plasmas J. Narendra, T.A. Grotjohn, J. Asmussen, Michigan State University |
| PS-WeP17 Laboratory Exercises for a Technician-Level Course in Plasma-Aided Manufacturing D.M. Hata, Portland Community College |