AVS 50th International Symposium
    Plasma Science and Technology Wednesday Sessions
       Session PS-WeP

Paper PS-WeP6
Inductively Coupled Plasmas in Cl@sub 2@/O@sub 2@ Mixtures: Modeling and Experiment

Wednesday, November 5, 2003, 11:00 am, Room Hall A-C

Session: Poster Session
Presenter: A.M. Efremov, Ivanovo State University of Chemistry and Technology, Russia
Authors: A.M. Efremov, Ivanovo State University of Chemistry and Technology, Russia
C.I. Kim, Chung-Ang University, Korea
D.P. Kim, Chung-Ang University, Korea
Correspondent: Click to Email
Microwave thin films resonators have been integrated with complex perovskite materials Ba(Mg@sub 1/3@Ta@sub 2/3@)O@sub 3@ (BMT) and Ba(Zn@sub 1/3@Ta@sub 2/3@)O@sub 3@ (BZT), which are very perspective materials due to excellent microwave properties. However, plasma etching in Cl-base gases is obstructed by two main problems. First problem is low etching rate due to low-volatility of metal-chlorides, which can be cleaned by strong ion bombardment. But, it is undesirable to avoid defects in structure. Second problem is the deviationsof stoichiometry on the surface after the etching due to various partial etching yields. The origins of these problems are also caused by low and different volatilities of reaction products. Therefore improvement of BMT and BZT etching technology should follow by the way of improvement of efficiency of chemical mechanism through the increasing of etching products volatility. In this way, Cl@sub 2@/O@sub 2@ mixture is very promising environment. The reason is that the formation of high-volatile metal-oxy-chlorides (M-ClO) is expected. We investigated plasma characteristics, plasma mass content and kinetic dependencies of both neutral and charged particle formation and decay in Cl@sub 2@/O@sub 2@ gas mixture. For these purposes we used a combination of experimental methods (OES, Langmuir probe, QMS) and a plasma modeling on the base of self-consistent solution of Boltzmann kinetic equation together with balance kinetic equations for neutral and charged particles in a quasi-stationary approximation. It was found that the change of O@sub 2@/(Cl@sub 2@+O@sub 2@) mixing ratio from 0 to 100% leads to an increase of electron average energy and electron energy distribution function deformation. The main mechanisms of Cl and O atom formation are the direct electron impact dissociation of corresponding molecules while the contribution of all possible secondary processes is not significant in the case of a relatively low O@sub 2@ addition.