AVS 50th International Symposium
    Plasma Science and Technology Wednesday Sessions
       Session PS-WeP

Paper PS-WeP4
Etching Characteristics in Novel Internal Linear Inductively Coupled Plasma Antenna for Flat Panel Display Applications

Wednesday, November 5, 2003, 11:00 am, Room Hall A-C

Session: Poster Session
Presenter: K.N. Kim, Sung Kyun Kwan University, South Korea
Authors: G.Y. Yeom, Sung Kyun Kwan University, South Korea
K.N. Kim, Sung Kyun Kwan University, South Korea
Y.J. Lee, Sung Kyun Kwan University, South Korea
B.U. Cho, Pohang University Science and Technology, Korea
J.K. Lee, Pohang University Science and Technology, Korea
M.A. Lieberman, University of California at Berkeley
Correspondent: Click to Email
The flat panel display (FPD) industry, especially for liquid crystal display (LCD) has been experiencing an impressive growth for the last 10 years, and moving to large generation sizes such a 1200mmX1500mm for reducing manufacturing costs, although third (550mmX650mm) and fourth generation (680mmX880mm) glass substrates are also available. Therefore, large-area plasma sources are needed to meet the plasma processing in display manufacturing plasma processing (PECVD, ETCH, and ASHING) and, to decrease the process time, high density plasma sources are required. In this study, large-area plasmas with inductive coupling of extended internal linear- antennas have been proposed promising candidate for the efficient high-density plasma source. The process chamber was designed as a rectangular mainly for FPD application and was made of stainless steel. The inner size of the chamber was 1020mmX830mm. To improve both the plasma density and the uniformity of internal ICP source, several internal-type linear antenna designs have been employed. In this presentation, the effects of various linear-antenna designs and process conditions on the plasma characteristics, such as plasma species and density, electron temperature, and plasma uniformity in this large area plasma source were investigated using a quadrupole masss spectrometer (QMS: Hidern Analytical Inc., PSM 500) and a Langmuir probe (Hiden Analytical Inc., ESP) located on the sidewall of the chamber. The results showed a strong relationship between the combination of the antenna configuration and plasma characteristics such as density and uniformity. The etch uniformities of SiO@sub2@ etched using C@sub4@F@sub8@(NF@sub3@)/He/O@sub2@ gas mixtures showed the similar trend as that of Ar@super+@ ion density.