| AVS 50th International Symposium | |
| Manufacturing Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:40am | MS-MoM2 Development of Low Resistance Copper Thin Films Using a Strain Enhanced Grain Growth Technique M. Moriyama, M. Shimada, H. Masuda, M. Murakami, Kyoto University, Japan |
| 9:00am | MS-MoM3 Processing and Characterization of PMSSQ Based Materials for Nanoporous Low-K Dielectrics P. Lazzeri, ITC-IRST, Italy, J.J. Park, Z. Lin, R.M. Briber, University of Maryland, L. Vanzetti, M. Anderle, M. Bersani, ITC-IRST, Italy, R.D. Miller, IBM Almaden Research Center, G.W. Rubloff, University of Maryland |
| 9:20am | MS-MoM4 Multi-scale Modeling of Chemical Mechanical Planarization L. Jiang, H. Simka, S. Skokov, D. Thakurta, S. Shankar, Intel Corp. |
| 9:40am | MS-MoM5 Thermal Characterization of Stacked 3D System-in-Package J. Valtanen, J. Miettinen, E.O. Ristolainen, Tampere University of Technology, Finland |
| 10:00am | MS-MoM6 Advanced Clean Process by Supercritical Carbon Dioxide H.-J. Tu, P. Chuang, C.-Y. Wang, Y.-L. Lin, H. Lo, M.-S. Zhou, M.-S. Liang, Taiwan Semiconductor Manufacturing Company, Ltd., Taiwan, R.O.C. |
| 10:20am | MS-MoM7 Two-Gas Reactive Sputtering W.D. Sproul, D.J. Christie, D.C. Carter, Advanced Energy Industries, Inc. |
| 10:40am | MS-MoM8 Hydrogen Pressure Dependence of Trench Corner Rounding during Hydrogen Annealing H. Kuribayashi, R. Shimizu, Fuji Electric Corporate Research and Development, Ltd., Japan, K. Sudoh, H. Iwasaki, Osaka University, Japan |
| 11:00am | MS-MoM9 Development of a Continuous Generation/Supply System of Highly-concentrated Ozone Gas for Low-temperature Oxidation Process S. Ichimura, H. Nonaka, National Institute of Advanced Industrial Science and Technology (AIST), Japan, Y. Morikawa, T. Noyori, T. Nishiguchi, M. Kekura, Meidensha Corporation, Japan |
| 11:20am | MS-MoM10 Profile Control for Deep Silicon Etch by Sidewall Passivation in High Density Plasma M. Khbeis, G. Metze, Laboratory for Physical Sciences, K. Powell, D. Thomas, A. Pentland, J. Hutchings, Trikon Technologies, Ltd. |
| 11:40am | MS-MoM11 The Study on Deformation of ArF Photo Resist in Dry Etching C.-H. Shin, G.J. Min, C.J. Kang, J.T. Moon, Samsung Electronics Co., Ltd., Korea |